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1. (WO2019050530) DURABLE ELECTROCHROMIC DEVICE INCLUDING TUNGSTEN OXIDE FILM PREPARED IN HIGH ION BOMBARDMENT AND LOW PRESSURE DEPOSITION ENVIRONMENT AND METHODS OF MAKING THE SAME
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Pub. No.: WO/2019/050530 International Application No.: PCT/US2017/050621
Publication Date: 14.03.2019 International Filing Date: 08.09.2017
IPC:
G02F 1/15 (2006.01)
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
15
based on electrochromic elements
Applicants:
GUARDIAN GLASS, LLC [US/US]; 2300 Harmon Road Auburn Hills, MI 48326-1714, US
ESSILOR INTERNATIONAL [FR/FR]; 147 Rue de Paris 94220 Charenton-le-Pont, FR
Inventors:
BLANCHARD, Francis; CA
BALOUKAS, Bill; CA
MARTINU, Ludvik; CA
Agent:
ROBERTS, Jonathan, A.; US
Priority Data:
Title (EN) DURABLE ELECTROCHROMIC DEVICE INCLUDING TUNGSTEN OXIDE FILM PREPARED IN HIGH ION BOMBARDMENT AND LOW PRESSURE DEPOSITION ENVIRONMENT AND METHODS OF MAKING THE SAME
(FR) DISPOSITIF ÉLECTROCHROME DURABLE COMPRENANT UN FILM D’OXYDE DE TUNGSTÈNE PRÉPARÉ DANS UN ENVIRONNEMENT DE BOMBARDEMENT IONIQUE ÉLEVÉ ET DE DÉPÔT BASSE PRESSION ET SES PROCÉDÉS DE FABRICATION
Abstract:
(EN) Certain example embodiments of this invention relate to electrochromic devices (100, 1500), assemblies incorporating electrochromic devices, and methods of making the same. Highly-durable electrochromic devices include tungsten oxide (e.g., W03 or other suitable stoichiometry) films (102, 1510) prepared using high-rate bias-enhanced sputter deposition. The sputtering is performed in a low-pressure (e.g., 1 mTorr) environment, and the biasing is very high (e.g., greater than -400 V, more preferably greater than -500 V), which causes high energy ion bombardment that in turn leads to partial nanocrystallization of the W03 matrix, while simultaneously generating the porous microstructure desirable for ionic diffusion.
(FR) Certains exemples de modes de réalisation de la présente invention concernent des dispositifs électrochromes (100, 1500), des ensembles incorporant des dispositifs électrochromes et des procédés de fabrication de ceux-ci. Des dispositifs électrochromes hautement durables comprennent des films d’oxyde de tungstène (par exemple WO3 ou une autre stœchiométrie adaptée) (102, 1510) préparés au moyen d’un dépôt par pulvérisation assisté par polarisation à haut débit. La pulvérisation est effectuée dans un environnement à basse pression (par exemple 1 mTorr), et la polarisation est très élevée (par exemple, supérieure à -400 V, plus préférentiellement supérieure à -500 V), ce qui provoque un bombardement ionique à haute énergie qui, à son tour, conduit à une nanocristallisation partielle de la matrice de WO3, tout en générant simultanément la microstructure poreuse souhaitable pour la diffusion ionique.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)