Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2019050507) METHODS OF HANDLING A MASK DEVICE, APPARATUS FOR EXCHANGING A MASK DEVICE, MASK EXCHANGE CHAMBER, AND VACUUM SYSTEM
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/050507 International Application No.: PCT/US2017/050129
Publication Date: 14.03.2019 International Filing Date: 05.09.2017
IPC:
H01L 51/56 (2006.01) ,H01L 51/00 (2006.01) ,H01L 21/67 (2006.01) ,H01L 21/033 (2006.01) ,G03F 7/20 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
033
comprising inorganic layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
Inventors:
GOVINDASAMY, Sathiyamurthi; IN
KLEIN, Wolfgang; DE
SALUGU, Srinivas; IN
SAUER, Andreas; DE
ZANG, Sebastian Gunther; DE
Agent:
PATTERSON, B. Todd; US
TACKETT, Keith M.; US
Priority Data:
Title (EN) METHODS OF HANDLING A MASK DEVICE, APPARATUS FOR EXCHANGING A MASK DEVICE, MASK EXCHANGE CHAMBER, AND VACUUM SYSTEM
(FR) PROCÉDÉS DE MANIPULATION D'UN DISPOSITIF DE MASQUAGE, APPAREIL D'ÉCHANGE D'UN DISPOSITIF DE MASQUAGE, CHAMBRE D'ÉCHANGE DE MASQUE ET SYSTÈME SOUS VIDE
Abstract:
(EN) Method of handling a mask device are described. According to m embodiment, the method includes: Loading the mask device on a holding arrangement for holding the mask device; moving the holding arrangement from a first state into a second state, the second slate being a non-horizontal state; aligning the holding- arrangement with a mask carrier; and transferring the mask device from the holding arrangement to the mask earner. Further, an apparatus for exchanging a mask device from a mask carrier as well as a vacuum system including such an apparatus are described.
(FR) L'invention concerne un procédé de manipulation de dispositif de masquage. Selon un mode de réalisation, le procédé consiste à : charger le dispositif de masquage sur un agencement de maintien pour maintenir le dispositif de masquage; faire passer l'agencement de maintien d'un premier état vers un second état, le second état étant un état non horizontal; aligner l'agencement de maintien avec un support de masque; et transférer le dispositif de masquage de l'agencement de maintien au support de masque. En outre, l'invention concerne un appareil d'échange d'un dispositif de masquage à partir d'un support de masque, ainsi qu'un système sous vide comprenant un tel appareil.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
CN109792004