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1. (WO2019050365) POROUS POLYURETHANE POLISHING PAD AND METHOD FOR MANUFACTURING SAME
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/050365 International Application No.: PCT/KR2018/010562
Publication Date: 14.03.2019 International Filing Date: 10.09.2018
IPC:
B24D 3/32 (2006.01) ,B24D 18/00 (2006.01) ,C08L 75/04 (2006.01) ,C08J 9/04 (2006.01) ,C08J 9/00 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
D
TOOLS FOR GRINDING, BUFFING OR SHARPENING
3
Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
02
the constituent being used as bonding agent
20
and being essentially organic
28
Resins
32
for porous or cellular structure
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
D
TOOLS FOR GRINDING, BUFFING OR SHARPENING
18
Manufacture of grinding tools, e.g. wheels, not otherwise provided for
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
75
Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
04
Polyurethanes
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
9
Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
04
using blowing gases generated by a previously added blowing agent
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
J
WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
9
Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
Applicants:
에스케이씨 주식회사 SKC CO., LTD. [KR/KR]; 경기도 수원시 장안구 장안로 309번길 84 84, Jangan-ro 309beon-gil, Jangan-gu, Suwon-si, Gyeonggi-do 16336, KR
Inventors:
서장원 SEO, Jang Won; KR
한혁희 HAN, Hyuk Hee; KR
허혜영 HEO, Hye Young; KR
류준성 RYOU, Joonsung; KR
권영필 KWON, Young Pil; KR
Agent:
제일특허법인(유) FIRSTLAW P.C.; 서울시 서초구 마방로 60 60 Mabang-Ro, Seocho-Ku, Seoul 06775, KR
Priority Data:
10-2017-011606911.09.2017KR
10-2017-011610811.09.2017KR
Title (EN) POROUS POLYURETHANE POLISHING PAD AND METHOD FOR MANUFACTURING SAME
(FR) TAMPON DE POLISSAGE EN POLYURÉTHANE POREUX ET SON PROCÉDÉ DE FABRICATION
(KO) 다공성 폴리우레탄 연마패드 및 이의 제조방법
Abstract:
(EN) An embodiment relates to a porous polyurethane polishing pad used in a chemical mechanical planarization process of a semiconductor, and a method for manufacturing the same, wherein polishing performance of the porous polyurethane polishing pad can be controlled by controlling the size and distribution of pores by using thermally expanded microcapsules as a solid phase forming agent, and an inert gas as a gas phase foaming agent.
(FR) Un mode de réalisation de l'invention concerne un tampon de polissage en polyuréthane poreux utilisé dans un procédé de planarisation mécano-chimique d'un semi-conducteur, et son procédé de fabrication, la performance de polissage du tampon de polissage en polyuréthane poreux pouvant être contrôlée en contrôlant la taille et de la distribution des pores grâce à l'utilisation de microcapsules thermiquement expansées en tant qu'agent de formation de phase solide, et d'un gaz inerte en tant qu'agent moussant en phase gazeuse.
(KO) 구현예는 반도체의 화학적 기계적 평탄화 공정에 사용되는 다공성 폴리우레탄 연마패드 및 이의 제조방법에 관한 것으로서, 상기 다공성 폴리우레탄 연마패드는 고상 발포제인 열팽창된 마이크로 캡슐 및 기상 발포제인 불활성 기체를 사용하여 포어의 크기 및 분포를 조절함으로써, 연마성능을 조절할 수 있다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)