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1. (WO2019050288) PELLICLE FRAME
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Pub. No.: WO/2019/050288 International Application No.: PCT/KR2018/010401
Publication Date: 14.03.2019 International Filing Date: 06.09.2018
IPC:
G03F 1/66 (2012.01) ,G03F 1/62 (2012.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
66
Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62
Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Applicants:
주식회사 에프에스티 FINE SEMITECH CORPORATION [KR/KR]; 경기도 화성시 동탄면 동탄산단6길 15-23 #15-23, Dongtansandan 6-gil, Dongtan-myeon, Hwaseong-si, Gyeonggi-do 18487, KR
Inventors:
조상진 CHO, Sang Jin; KR
김명전 KIM, Myung Jun; KR
김지강 KIM, Ji Kang; KR
Agent:
특허법인 다인 DYNE PATENT & LAW FIRM; 경기도 성남시 분당구 느티로 16, 제7층 705호 #705, 7th Floor, 16, Neuti-ro, Bundang-gu, Seongnam-si, Gyeonggi-do 13558, KR
Priority Data:
10-2017-011506308.09.2017KR
Title (EN) PELLICLE FRAME
(FR) CADRE DE PELLICULE
(KO) 펠리클 프레임
Abstract:
(EN) The present invention relates to a frame for a lithographic pellicle that is attached to a mask and used as an anti-dust membrane while manufacturing a semiconductor device, a liquid crystal display, etc. The present invention provides a pellicle frame comprising: a first surface facing a photomask; a second surface parallel to the first surface; a pair of long sides; a pair of short sides; and four corner parts at which the long sides meet the short sides, wherein the corner parts on the first surface are recessed, thereby making a difference in height across the frame. The pellicle frame according to the present invention has a height difference made at each of the corner parts thereof, and thus the surface of the photomask is not affected even by the effect of an increase in the thickness of the corner part due to attachment of a pellicle membrane.
(FR) La présente invention concerne un cadre pour une pellicule lithographique attachée à un masque et destinée à être utilisée en tant que membrane anti-poussière lors de la fabrication d'un dispositif à semi-conducteur, d'un afficheur à cristaux liquides, etc. La présente invention concerne un cadre de pellicule comprenant : une première surface faisant face à un photomasque ; une seconde surface parallèle à la première surface ; une paire de côtés longs ; une paire de côtés courts ; et quatre parties de coin au niveau desquelles les côtés longs rencontrent les côtés courts, les parties de coin sur la première surface étant en retrait, ce qui permet d'obtenir une différence de hauteur au niveau du cadre. Le cadre de pellicule selon la présente invention présente une différence de hauteur au niveau de chacune de ses parties de coin et la surface du photomasque n'est par conséquent pas affectée, pas même par l'effet d'une augmentation de l'épaisseur de la partie de coin due à la fixation d'une membrane de pellicule.
(KO) 본 발명은 반도체 디바이스 또는 액정 디스플레이 등을 제조할 때 마스크에 부착되어 방진막으로 사용되는 리소그라피용 펠리클의 프레임에 관한 것이다. 본 발명은 포토 마스크를 향하는 제1면과 그 제1면과 나란한 제2면을 구비하며, 한 쌍의 장변, 한 쌍의 단변 및 장변과 단변이 만나는 네 개의 모서리부를 구비하는 펠리클 프레임에 있어서, 상기 제1면의 모서리부가 오목하여 고저차가 형성된 것을 특징으로 하는 펠리클 프레임을 제공한다. 본 발명에 따른 펠리클 프레임은 모서리부에 고저차가 형성되어 있으므로, 펠리클 막 부착에 따른 살오름 현상이 발생하여도, 포토 마스크 면에는 영향을 미치지 않는다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)