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1. (WO2019049940) PATTERN DRAWING DEVICE
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Pub. No.: WO/2019/049940 International Application No.: PCT/JP2018/033073
Publication Date: 14.03.2019 International Filing Date: 06.09.2018
IPC:
G03F 7/20 (2006.01) ,B41J 2/47 (2006.01) ,G02B 26/12 (2006.01) ,H05K 3/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
J
TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
2
Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
435
characterised by selective application of radiation to a printing material or impression-transfer material
47
using the combination of scanning and modulation of light
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
26
Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
08
for controlling the direction of light
10
Scanning systems
12
using multifaceted mirrors
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
K
PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
3
Apparatus or processes for manufacturing printed circuits
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
鬼頭義昭 KITO Yoshiaki; JP
加藤正紀 KATO Masaki; JP
Agent:
千葉剛宏 CHIBA Yoshihiro; JP
宮寺利幸 MIYADERA Toshiyuki; JP
千馬隆之 SENBA Takayuki; JP
仲宗根康晴 NAKASONE Yasuharu; JP
坂井志郎 SAKAI Shiro; JP
関口亨祐 SEKIGUCHI Kosuke; JP
Priority Data:
2017-17260108.09.2017JP
Title (EN) PATTERN DRAWING DEVICE
(FR) DISPOSITIF DE DESSIN DE MOTIF
(JA) パターン描画装置
Abstract:
(EN) While modulating the intensity of a drawing beam (LBn) to be projected as spot light (SP') to a substrate (P) on the basis of drawing data of a pattern defined by multiple pixels (PIC), this pattern drawing device (EX) relatively scans the projection position of the spot light (SP') along two-dimensional arrangement of the pixels (PIC) on the substrate (P). The pattern drawing device (EX) is provided with: a light source unit (LS) which, on the basis of the drawing data, emits a predetermined number of pulsed light beams to be oscillated as drawing beams with a predetermined period (Tf) to respective exposure pixels that are irradiated with the spot light (SP') during the relative scanning, and suspends the emission of the predetermined number of pulsed light beams to respective non-exposure pixels that are not irradiated with the spot light (SP') during the relative scanning; and a drawing control unit (200) which controls the light source unit (LS) such that the number of pulsed light beams to be emitted to edge part exposure pixels (PIC') corresponding to an edge part of the pattern among the exposure pixels increases or decreases relatively to the predetermined number.
(FR) Tout en modulant l’intensité d’un faisceau de dessin (LBn) devant être projeté en tant que lumière ponctuelle (SP’) sur un substrat (P) sur la base de données de dessin d’un motif défini par des pixels multiples (PIC), le dispositif de dessin de motif (EX) selon la présente invention balaye relativement la position de projection de la lumière ponctuelle (SP’) le long d’un agencement bidimensionnel des pixels (PIC) sur le substrat (P). Le dispositif de dessin de motif (EX) est pourvu de : une unité de source de lumière (LS) qui, sur la base des données de dessin, émet un nombre prédéterminé de faisceaux lumineux pulsés amenant à osciller en tant que faisceaux de dessin avec une période prédéterminée (Tf) vers des pixels d’exposition respectifs qui sont irradiés avec la lumière ponctuelle (SP’) pendant le balayage relatif, et suspend l’émission du nombre prédéterminé de faisceaux lumineux pulsés vers des pixels non exposés respectifs qui ne sont pas irradiés avec la lumière ponctuelle (SP’) pendant le balayage relatif ; et une unité de commande de dessin (200) qui commande l’unité de source de lumière (LS) de sorte que le nombre de faisceaux de lumière pulsés devant être émis vers des pixels d’exposition de partie de bord (PIC’) correspondant à une partie de bord du motif parmi les pixels d’exposition augmente ou diminue par rapport au nombre prédéterminé.
(JA) パターン描画装置(EX)は、スポット光(SP')として基板(P)に投射される描画ビーム(LBn)の強度を、多数の画素(PIC)で規定されるパターンの描画データに基づいて変調しつつ、スポット光(SP')の投射位置を基板(P)上で画素(PIC)の2次元的な配列に沿って相対走査する。パターン描画装置(EX)は、描画データに基づいて、相対走査中にスポット光(SP')が照射される露光画素の各々に対しては、描画ビームとして所定周期(Tf)で発振されるパルス光の所定数を射出し、相対走査中にスポット光(SP')が非照射とされる非露光画素の各々に対しては所定数のパルス光の射出を中断する光源装置(LS)と、描画データに基づいて、露光画素のうちでパターンのエッジ部に対応したエッジ部露光画素(PIC')に対して射出されるパルス光の数が、所定数に対して相対的に増減されるように光源装置(LS)を制御する描画制御装置(200)と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)