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1. (WO2019049919) PHOTOMASK BLANK, PHOTOMASK, LIGHT EXPOSURE METHOD AND METHOD FOR PRODUCING DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/049919 International Application No.: PCT/JP2018/032984
Publication Date: 14.03.2019 International Filing Date: 06.09.2018
IPC:
G03F 1/58 (2012.01) ,B32B 15/04 (2006.01) ,C03C 15/00 (2006.01) ,C03C 17/36 (2006.01) ,G03F 1/38 (2012.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
54
Absorbers, e.g. opaque materials
58
having two or more different absorber layers, e.g. stacked multilayer absorbers
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
15
Layered products essentially comprising metal
04
comprising metal as the main or only constituent of a layer, next to another layer of a specific substance
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
15
Surface treatment of glass, not in the form of fibres or filaments, by etching
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17
Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating
34
with at least two coatings having different compositions
36
at least one coating being a metal
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
38
Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都港区港南二丁目15番3号 15-3, Konan 2-chome, Minato-ku, Tokyo 1086290, JP
Inventors:
小澤 隆仁 OZAWA, Takashi; JP
寶田 庸平 TAKARADA, Yohei; JP
林 賢利 HAYASHI, Kento; JP
八神 高史 YAGAMI, Takashi; JP
Agent:
永井 冬紀 NAGAI, Fuyuki; JP
白石 直正 SHIRAISHI, Naomasa; JP
Priority Data:
2017-17199707.09.2017JP
Title (EN) PHOTOMASK BLANK, PHOTOMASK, LIGHT EXPOSURE METHOD AND METHOD FOR PRODUCING DEVICE
(FR) PLAQUE POUR PHOTOMASQUE, PHOTOMASQUE, PROCÉDÉ D'EXPOSITION À LA LUMIÈRE ET PROCÉDÉ PERMETTANT DE PRODUIRE UN DISPOSITIF
(JA) フォトマスクブランクス、フォトマスク、露光方法、及び、デバイスの製造方法
Abstract:
(EN) This photomask blank comprises: a substrate; and at least a first layer and a second layer, which are sequentially arranged from the substrate side. The first layer contains chromium; the second layer contains chromium and oxygen; and the surface of the second layer has an arithmetic mean height of 0.245 nm or more.
(FR) L'invention concerne une plaque pour photomasque qui comprend : un substrat ; et au moins une première couche et une seconde couche, qui sont placées successivement à partir du côté substrat. La première couche contient du chrome ; la seconde couche contient du chrome et de l'oxygène ; et la surface de la seconde couche a une hauteur moyenne arithmétique de 0,245 nm ou plus.
(JA) フォトマスクブランクスは、基板と、前記基板側から順に少なくとも第1の層および第2の層を有するフォトマスクブランクスであって、前記第1の層は、クロムを含有し、前記第2の層は、クロムと酸素とを含有し、前記第2の層の表面の算術平均高さが0.245nm以上である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)