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1. (WO2019049907) HYDROPHOBIC SILICA POWDER
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Pub. No.: WO/2019/049907 International Application No.: PCT/JP2018/032938
Publication Date: 14.03.2019 International Filing Date: 05.09.2018
IPC:
C01B 33/18 (2006.01) ,G03G 9/097 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
33
Silicon; Compounds thereof
113
Silicon oxides; Hydrates thereof
12
Silica; Hydrates thereof, e.g. lepidoic silicic acid
18
Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G
ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
9
Developers
08
with toner particles
097
Plasticisers; Charge controlling agents
Applicants:
扶桑化学工業株式会社 FUSO CHEMICAL CO., LTD. [JP/JP]; 大阪府大阪市中央区高麗橋4丁目3番10号 3-10, Koraibashi 4-chome, Chuo-ku, Osaka-shi, Osaka 5410043, JP
Inventors:
面川 一意 OMOKAWA, Kazui; JP
横田 浩一 YOKOTA, Hirokazu; JP
竹内 健一 TAKEUCHI, Kenichi; JP
根岸 佑馬 NEGISHI, Yuma; JP
鬼石 智子 KISEKI, Tomoko; JP
河本 宗範 KOMOTO, Munenori; JP
Agent:
特許業務法人三枝国際特許事務所 SAEGUSA & PARTNERS; 大阪府大阪市中央区道修町1-7-1 北浜TNKビル Kitahama TNK Building, 1-7-1, Doshomachi, Chuo-ku, Osaka-shi, Osaka 5410045, JP
Priority Data:
2017-17211307.09.2017JP
Title (EN) HYDROPHOBIC SILICA POWDER
(FR) POUDRE DE SILICE HYDROPHOBE
(JA) 疎水性シリカ粉末
Abstract:
(EN) Provided is a hydrophobic silica powder which is obtained by a sol-gel method and has excellent chargeability. The hydrophobic silica powder is characterized by having a hydrophobicity of 50% or more, a saturated water content of 4% or less, and a nitrogen content of 0.05% or more.
(FR) L'invention concerne une poudre de silice hydrophobe qui est obtenue par un procédé sol-gel et présente une excellente capacité de charge. Ladite poudre de silice hydrophobe est caractérisée en ce qu'elle a une hydrophobicité égale ou supérieure à 50 %, une teneur en eau saturée égale ou inférieure à 4 %, et une teneur en azote égale ou supérieure à 0,05 %.
(JA) ゾルゲル法により得られ、帯電性にも優れた疎水性シリカ粉末を提供すること。 疎水化度が50%以上、飽和水分量が4%以下、窒素含有量が0.05%以上であることを特徴とする、疎水性シリカ粉末。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)