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1. (WO2019049795) COMPOSITION, FILM, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING PATTERNED SUBSTRATE
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Pub. No.: WO/2019/049795 International Application No.: PCT/JP2018/032434
Publication Date: 14.03.2019 International Filing Date: 31.08.2018
IPC:
C09D 201/02 (2006.01) ,C07D 317/46 (2006.01) ,C07D 317/54 (2006.01) ,C07D 317/64 (2006.01) ,C07D 405/14 (2006.01) ,C08L 101/06 (2006.01) ,C09D 5/00 (2006.01) ,G03F 7/11 (2006.01) ,G03F 7/20 (2006.01) ,G03F 7/26 (2006.01)
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
201
Coating compositions based on unspecified macromolecular compounds
02
characterised by the presence of specified groups
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
317
Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
08
having the hetero atoms in positions 1 and 3
44
ortho- or peri-condensed with carbocyclic rings or ring systems
46
condensed with one six-membered ring
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
317
Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
08
having the hetero atoms in positions 1 and 3
44
ortho- or peri-condensed with carbocyclic rings or ring systems
46
condensed with one six-membered ring
48
Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring
50
with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to atoms of the carbocyclic ring
54
Radicals substituted by oxygen atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
317
Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
08
having the hetero atoms in positions 1 and 3
44
ortho- or peri-condensed with carbocyclic rings or ring systems
46
condensed with one six-membered ring
48
Methylenedioxybenzenes or hydrogenated methylenedioxybenzenes, unsubstituted on the hetero ring
62
with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to atoms of the carbocyclic ring
64
Oxygen atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
405
Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
14
containing three or more hetero rings
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
101
Compositions of unspecified macromolecular compounds
02
characterised by the presence of specified groups
06
containing oxygen atoms
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
5
Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
Applicants:
JSR株式会社 JSR CORPORATION [JP/JP]; 東京都港区東新橋一丁目9番2号 9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo 1058640, JP
Inventors:
中津 大貴 NAKATSU Hiroki; JP
高梨 和憲 TAKANASHI Kazunori; JP
酒井 一憲 SAKAI Kazunori; JP
松村 裕史 MATSUMURA Yuushi; JP
中川 大樹 NAKAGAWA Hiroki; JP
Agent:
天野 一規 AMANO Kazunori; JP
Priority Data:
2017-17255907.09.2017JP
Title (EN) COMPOSITION, FILM, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING PATTERNED SUBSTRATE
(FR) COMPOSITION, FILM, PROCÉDÉ DE FORMATION DE FILM, ET PROCÉDÉ DE PRODUCTION DE SUBSTRAT À MOTIFS
(JA) 組成物、膜、膜の形成方法及びパターニングされた基板の製造方法
Abstract:
(EN) The purpose of the invention is to provide: a composition capable of forming a film exhibiting excellent flatness, wet peeling resistance, and pattern bending resistance while maintaining solvent resistance; a film; a method for forming a film; and a method for producing a patterned substrate. The present invention pertains to a composition containing a solvent and a compound having a group represented by formula (1), having a molecular weight of at least 200, and having a carbon atom content of at least 40 mass%. In formula (1), R1 and R2 are each independently a hydrogen atom, a fluorine atom, a C1-20 monovalent hydrocarbon group or C1-20 monovalent fluorinated hydrocarbon group, or a portion of an alicyclic structure which has 3-20 ring members and in which these groups are combined with each other together with carbon atoms bonded to these groups. Ar1 is a group obtained by removing (n+3) hydrogen atoms from an arene or heteroarene having 6-20 ring members. X is an oxygen atom, -CR3R4-, -CR3R4-O- or -O-CR3R4-.
(FR) L'objectif de l'invention est de fournir : une composition apte à former un film présentant une excellente planéité, une excellente résistance au pelage humide, et une résistance à la flexion de motif tout en maintenant la résistance aux solvants ; un film ; un procédé de formation d'un film ; et un procédé de production d'un substrat à motifs. À cet effet, la présente invention concerne une composition contenant un solvant et un composé ayant un groupe représenté par la formule (1), ayant un poids moléculaire d'au moins 200, et ayant une teneur en atomes de carbone d'au moins 40 % en masse. Dans la formule (1), R1 et R2 représentent chacun indépendamment un atome d'hydrogène, un atome de fluor, un groupe hydrocarboné monovalent en C1-20 ou un groupe hydrocarboné fluoré monovalent en C1-20, ou une partie d'une structure alicyclique qui possède 3 à 20 éléments cycliques et dans laquelle ces groupes sont combinés les uns aux autres par des atomes de carbone liés à ces groupes. Ar1 est un groupe obtenu par élimination de (n +3) atomes d'hydrogène d'un arène ou d'un hétéroarène ayant 6 à 20 chaînons de cycle. X est un atome d'oxygène, -CR3R4-, -CR3R4-O- ou -O-CR3R4-.
(JA) 溶媒耐性を維持しつつ、平坦性、ウェット剥離耐性及びパターンの曲り耐性に優れる膜を形成できる組成物、膜、膜の形成方法及びパターニングされた基板の製造方法の提供を目的とする。本発明は、下記式(1)で表される基を有し、分子量が200以上であり、炭素原子の含有率が40質量%以上である化合物と、溶媒とを含有する組成物である。下記式(1)中、R及びRは、それぞれ独立して、水素原子、フッ素原子、炭素数1~20の1価の炭化水素基若しくは炭素数1~20の1価のフッ素化炭化水素基であるか、又はこれらの基が互いに合わせられこれらが結合する炭素原子と共に構成される環員数3~20の脂環構造の一部である。Arは、環員数6~20のアレーン又はヘテロアレーンから(n+3)個の水素原子を除いた基である。Xは、酸素原子、-CR-、-CR-O-又は-O-CR-である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)