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1. (WO2019049786) WATER-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING USE, AND PHOTOSENSITIVE RESIN ORIGINAL PLATE FOR FLEXOGRAPHIC PRINTING USE WHICH IS PRODUCED FROM SAME
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Pub. No.: WO/2019/049786 International Application No.: PCT/JP2018/032375
Publication Date: 14.03.2019 International Filing Date: 31.08.2018
IPC:
G03F 7/004 (2006.01) ,B41N 1/12 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/037 (2006.01) ,G03F 7/11 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
12
non-metallic other than stone
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
037
the binders being polyamides or polyimides
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
Applicants:
東洋紡株式会社 TOYOBO CO., LTD. [JP/JP]; 大阪府大阪市北区堂島浜二丁目2番8号 2-8, Dojima Hama 2-chome, Kita-ku, Osaka-shi, Osaka 5308230, JP
Inventors:
川島 渉 KAWASHIMA, Wataru; JP
蓮池 準 HASUIKE, Jun; JP
Agent:
風早 信昭 KAZAHAYA, Nobuaki; JP
浅野 典子 ASANO, Noriko; JP
Priority Data:
2017-17017805.09.2017JP
Title (EN) WATER-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING USE, AND PHOTOSENSITIVE RESIN ORIGINAL PLATE FOR FLEXOGRAPHIC PRINTING USE WHICH IS PRODUCED FROM SAME
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE POUVANT ÊTRE DÉVELOPPÉE DANS L'EAU POUR IMPRESSION FLEXOGRAPHIQUE, ET PLAQUE ORIGINALE EN RÉSINE PHOTOSENSIBLE POUR IMPRESSION FLEXOGRAPHIQUE PRODUITE À PARTIR DE LADITE COMPOSITION
(JA) 水現像可能なフレキソ印刷用感光性樹脂組成物、及びそれから得られるフレキソ印刷用感光性樹脂原版
Abstract:
(EN) Provided is a photosensitive resin composition for a flexographic printing original plate that is a low-hardness plate capable of being used in flexographic printing, is reduced in the adhesion of dust, dirt and paper dust onto a relief part formed therein, satisfies UV ink resistance and printing original plate long-term storage stability, and has high quality. The present invention is a water-developable photosensitive resin composition for flexographic printing use, which contains at least (a) polyamide and/or a polyamide block copolymer, (b) a crosslinking agent having at least one unsaturated group, (c) a photopolymerization initiator and (d) a fatty acid ester, the resin composition being characterized in that the fatty acid ester (d) is a fatty acid ester having at least two hydroxyl groups and 24 or 25 carbon atoms in the molecule thereof and is a fatty acid ester of a compound selected from fatty acids each having 12 to 22 carbon atoms, and also characterized in that the content of the fatty acid ester (d) in the photosensitive resin composition is 0.2 to 6% by weight.
(FR) L'invention concerne une composition de résine photosensible pour une plaque originale d'impression flexographique qui est une plaque de faible dureté pouvant être utilisée dans l'impression flexographique, qui permet de réduire l'adhérence de la poussière, de la saleté et de la poussière de papier sur une partie en relief formée à l'intérieur de ladite plaque, satisfait la résistance de l'encre UV et la stabilité de stockage à long terme de plaques originales d'impression, et présente une qualité supérieure. La présente invention porte sur une composition de résine photosensible pouvant être développée dans l'eau, destinée à être utilisée dans l'impression flexographique, qui contient au moins (a) un polyamide et/ou un copolymère séquencé de polyamide, (b) un agent de réticulation ayant au moins un groupe insaturé, (c) un initiateur de photopolymérisation et (d) un ester d'acide gras, la composition de résine étant caractérisée en ce que l'ester d'acide gras (d) est un ester d'acide gras ayant au moins deux groupes hydroxyle et 24 ou 25 atomes de carbone dans sa molécule et est un ester d'acide gras d'un composé choisi parmi les acides gras ayant chacun 12 à 22 atomes de carbone, et caractérisée en ce que la teneur de l'ester d'acide gras (d) dans la composition de résine photosensible est de 0,2 à 6 % en poids.
(JA) フレキソ印刷に用いられる低硬度版でありがら、レリーフへの塵、埃、紙粉の付着の低減とUVインキ耐性だけでなく、印刷原版の長期保存性も満足させた高品質のフレキソ印刷原版用感光性樹脂組成物を提供する。本発明は、少なくとも(a)ポリアミド及び/又はポリアミドブロック共重合体、(b)1つ以上の不飽和基を有する架橋剤、(c)光重合開始剤、及び(d)脂肪酸エステルを含有する水現像可能なフレキソ印刷用感光性樹脂組成物であって、(d)脂肪酸エステルが、2個以上のヒドロキシル基と24個又は25個の炭素原子を分子内に有する脂肪酸エステルであって、炭素数12~22の脂肪酸から選ばれる化合物の脂肪酸エステルであること、及び感光性樹脂組成物中の(d)脂肪酸エステルの含有量が、0.2~6重量%であることを特徴とする。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)