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1. (WO2019049754) FLUORINE-CONTAINING COMPOUND, COMPOSITION, AND ARTICLE
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Pub. No.: WO/2019/049754 International Application No.: PCT/JP2018/032003
Publication Date: 14.03.2019 International Filing Date: 29.08.2018
IPC:
C07F 7/18 (2006.01) ,B32B 9/00 (2006.01) ,C09D 5/08 (2006.01) ,C09K 3/18 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7
Compounds containing elements of the 4th Group of the Periodic System
02
Silicon compounds
08
Compounds having one or more C-Si linkages
18
Compounds having one or more C-Si linkages as well as one or more C-O-Si linkages
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
5
Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
08
Anti-corrosive paints
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
18
for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Applicants:
AGC株式会社 AGC INC. [JP/JP]; 東京都千代田区丸の内一丁目5番1号 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405, JP
Inventors:
伊藤 昌宏 ITO Masahiro; JP
星野 泰輝 HOSHINO Taiki; JP
青山 元志 AOYAMA Motoshi; JP
Agent:
泉名 謙治 SENMYO Kenji; JP
小川 利春 OGAWA Toshiharu; JP
金 鎭文 KIM Jin-Moon; JP
比企野 健 HIKINO Ken; JP
横井 大一郎 YOKOI Daiichiro; JP
Priority Data:
2017-17024005.09.2017JP
Title (EN) FLUORINE-CONTAINING COMPOUND, COMPOSITION, AND ARTICLE
(FR) COMPOSÉ CONTENANT DU FLUOR, COMPOSITION ET ARTICLE
(JA) 含フッ素化合物、組成物および物品
Abstract:
(EN) Provided are a fluorine-containing compound, a composition, and an article with which it is possible to form a surface layer having exceptional weather resistance and corrosion resistance. A fluorine-containing compound represented by the formula R1–(OX)m–Y–Z(R2)q (R3)r –q. R1 is a perfluoroalkyl group. X is an C2 or greater alkylene group having one or more fluorine atoms. m is an integer of 0-6. Y is a single bond or a prescribed linking group. However, when Y is an alkylene group including –OCF2–, the number of –OCF2– in the alkylene group is one. R4 is a hydrogen atom or an alkyl group. Z is a carbon atom, a silicon atom, or a nitrogen atom. R2 is a hydrogen atom, a hydroxyl group, or an alkyl group. R3 is –L1–Si(R)nL3–n, where R is a monovalent hydrocarbon group, L is a hydrolyzable group or a hydroxyl group, n is an integer of 0-2, and L1 is an alkylene group that may have –O–. r is 2 or 3, and q is an integer of 0-2.
(FR) L'invention concerne un composé contenant du fluor, une composition et un article permettant de former une couche de surface ayant une résistance exceptionnelle aux intempéries et à la corrosion. L'invention concerne également un composé contenant du fluor représenté par la formule R1–(OX)m–Y–Z(R2)q (R3)r –q. R1 représente un groupe perfluoroalkyle. X représente un groupe alkylène en C2 ou plus ayant un ou plusieurs atomes de fluor. m est un nombre entier de 0 à 6. Y est une liaison simple ou un groupe de liaison pré-déterminé. Cependant, lorsque Y est un groupe alkylène comprenant –OCF2–, le nombre de –OCF2– dans le groupe alkylène est un. R4 représente un atome d'hydrogène ou un groupe alkyle. Z représente un atome de carbone, un atome de silicium ou un atome d'azote. R2 représente un atome d'hydrogène, un groupe hydroxyle ou un groupe alkyle. R3 est –L1–Si(R)nL3–n, R étant un groupe hydrocarboné monovalent, L est un groupe hydrolysable ou un groupe hydroxyle, n est un nombre entier de 0 à 2, et L1 est un groupe alkylène qui peut avoir –O–. r est 2 ou 3, et q est un nombre entier de 0 à 2.
(JA) 耐候性および耐食性に優れた表面層を形成できる含フッ素化合物、組成物および物品の提供。 R-(OX)-Y-Z(R(Rr-qで表される含フッ素化合物。Rは、ペルフルオロアルキル基である。Xは、1個以上のフッ素原子を有する炭素数2以上のアルキレン基である。mは、0~6の整数である。Yは、単結合または所定の連結基である。ただし、Yが-OCF-を含むアルキレン基である場合、アルキレン基中の-OCF-の数は1個である。Rは、水素原子またはアルキル基である。Zは、炭素原子、ケイ素原子または窒素原子である。Rは、水素原子、水酸基またはアルキル基である。Rは-L-Si(R)3-nであり、Rは1価の炭化水素基、Lは加水分解性基または水酸基、nは0~2の整数、Lは-O-を有していてもよいアルキレン基である。rは2または3、qは0~2の整数である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)