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1. WO2019049735 - METHOD FOR FORMING INSULATING FILM, APPARATUS FOR PROCESSING SUBSTRATE, AND SYSTEM FOR PROCESSING SUBSTRATE

Publication Number WO/2019/049735
Publication Date 14.03.2019
International Application No. PCT/JP2018/031810
International Filing Date 28.08.2018
IPC
H01L 21/312 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
31to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers; Selection of materials for these layers
312Organic layers, e.g. photoresist
B05C 9/12 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
9Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by groups B05C1/-B05C7/159
08for applying liquid or other fluent material and performing an auxiliary operation
12the auxiliary operation being performed after the application
B05C 9/14 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
9Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by groups B05C1/-B05C7/159
08for applying liquid or other fluent material and performing an auxiliary operation
14the auxiliary operation involving heating
B05C 13/02 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
13Means for manipulating or holding work, e.g. for separate articles
02for particular articles
B05D 1/36 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1Processes for applying liquids or other fluent materials
36Successively applying liquids or other fluent materials, e.g. without intermediate treatment
B05D 3/02 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
3Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
02by baking
CPC
B05C 11/08
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
11Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; ; Controlling means therefor
08Spreading liquid or other fluent material by manipulating the work, e.g. tilting
B05C 13/02
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
13Means for manipulating or holding work, e.g. for separate articles
02for particular articles
B05C 9/12
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
9Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
08for applying liquid or other fluent material and performing an auxiliary operation
12the auxiliary operation being performed after the application
B05C 9/14
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
9Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
08for applying liquid or other fluent material and performing an auxiliary operation
14the auxiliary operation involving heating ; or cooling
B05D 1/36
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1Processes for applying liquids or other fluent materials
36Successively applying liquids or other fluent materials, e.g. without intermediate treatment
B05D 3/02
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
3Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
02by baking
Applicants
  • 東京エレクトロン株式会社 TOKYO ELECTRON LIMITED [JP]/[JP]
Inventors
  • 村松 誠 MURAMATSU, Makoto
  • 源島 久志 GENJIMA, Hisashi
Agents
  • 特許業務法人弥生特許事務所 YAYOY PATENT OFFICE
Priority Data
2017-17428711.09.2017JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) METHOD FOR FORMING INSULATING FILM, APPARATUS FOR PROCESSING SUBSTRATE, AND SYSTEM FOR PROCESSING SUBSTRATE
(FR) PROCÉDÉ DE FORMATION DE FILM ISOLANT, APPAREIL DE TRAITEMENT DE SUBSTRAT ET SYSTÈME DE TRAITEMENT DE SUBSTRAT
(JA) 絶縁膜の成膜方法、基板処理装置及び基板処理システム
Abstract
(EN)
[Problem] To provide a technique by which good film quality can be achieved when forming a silicon oxide-containing insulation film as a coating film on a substrate. [Solution] A coating solution containing a polysilazane is applied onto a wafer W, the solvent of the coating solution is volatilized, and then the coating film is irradiated with ultraviolet rays in a nitrogen atmosphere before performing a curing process. Dangling bonds are thus generated in silicon which is a pre-hydrolyzed site in the polysilazane. Therefore, the energy required for hydrolysis is reduced, and unhydrolyzed sites are thus reduced even when the temperature of the curing process is set to 350°C. Since efficient dehydration condensation occurs as a result, the degree of crosslinking is improved, and a dense (high-quality) insulation film can be formed. In addition, by forming a protective film on the surface of the coating film after the coating film has been irradiated with ultraviolet rays, the reaction of dangling bonds prior to the curing process can be suppressed, and the film quality of the coating film is improved.
(FR)
Le problème décrit par la présente invention est de produire une technique permettant d'obtenir une bonne qualité de film lors de la formation d'un film d'isolation contenant de l'oxyde de silicium en tant que film de revêtement sur un substrat. La solution selon l'invention consiste à appliquer une solution de revêtement contenant un polysilazane sur une tranche (W), à volatiliser le solvant de la solution de revêtement, puis à exposer le film de revêtement à des rayons ultraviolets dans une atmosphère d'azote avant de mettre en œuvre un procédé de durcissement. Des liaisons pendantes sont ainsi produites dans du silicium qui est un site pré-hydrolysé dans le polysilazane. Par conséquent, l'énergie nécessaire à l'hydrolyse est réduite, et les sites non hydrolysés sont ainsi réduits même lorsque la température du procédé de durcissement est réglée à 350 °C. Étant donné qu'une condensation de déshydratation efficace se produit en conséquence, le degré de réticulation est amélioré, et un film d'isolation dense (de haute qualité) peut être formé. De plus, la formation d'un film protecteur sur la surface du film de revêtement après exposition du film de revêtement à des rayons ultraviolets permet de supprimer la réaction de liaisons pendantes avant la mise en œuvre du procédé de durcissement, et d'améliorer la qualité de film du film de revêtement.
(JA)
【課題】基板上に酸化シリコンを含む絶縁膜を塗布膜として形成するにあたって、良好な膜質が得られる技術を提供すること。 【解決手段】ポリシラザンを含む塗布液をウエハWに塗布し、塗布液の溶媒を揮発させた後、キュア工程を行う前に、窒素雰囲気で前記塗布膜に紫外線を照射している。このためポリシラザンにおける予め加水分解される部位であるシリコンに未結合手を生成される。そのため加水分解に必要なエネルギーが低下することから、キュア工程の温度を350℃としたときにも、加水分解されずに残る部位が少なくなる。この結果効率的に脱水縮合が起こるので、架橋率が向上して緻密な(良質な膜質である)絶縁膜を成膜することができる。 また前記塗布膜に紫外線を照射した後塗布膜の表面に保護膜を形成することにより、キュア工程前における未結合手の反応を抑制することができ、塗布膜の膜質が良好になる。
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