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1. (WO2019049634) GAS BARRIER FILM AND METHOD FOR PRODUCING GAS BARRIER FILM
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Pub. No.: WO/2019/049634 International Application No.: PCT/JP2018/030529
Publication Date: 14.03.2019 International Filing Date: 17.08.2018
IPC:
B32B 9/00 (2006.01) ,B32B 27/28 (2006.01) ,C23C 16/42 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
28
comprising copolymers of synthetic resins not wholly covered by any one of the following subgroups
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
42
Silicides
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
岩瀬 英二郎 IWASE Eijiro; JP
Agent:
中島 順子 NAKASHIMA Junko; JP
米倉 潤造 YONEKURA Junzo; JP
村上 泰規 MURAKAMI Yasunori; JP
Priority Data:
2017-17121206.09.2017JP
2018-10819706.06.2018JP
Title (EN) GAS BARRIER FILM AND METHOD FOR PRODUCING GAS BARRIER FILM
(FR) FILM BARRIÈRE CONTRE LES GAZ ET PROCÉDÉ DE PRODUCTION D'UN FILM BARRIÈRE CONTRE LES GAZ
(JA) ガスバリアフィルムおよびガスバリアフィルムの製造方法
Abstract:
(EN) The present invention addresses the problem of providing: a novel gas barrier film which has high durability and good productivity; and a method for producing this gas barrier film. A gas barrier film according to the present invention comprises a supporting body, and an inorganic layer and a resin film, which are supported by the supporting body, in this order. The resin film has a hydroxyl group; the inorganic layer and the resin film are directly bonded with each other, while partially having a separated part at the interface; and this gas barrier film has one or more combinations of the inorganic layer and the resin film. In a method for producing a gas barrier film according to the present invention, after the formation of an inorganic layer by a vapor deposition method, a resin film having a hydroxyl group is laminated on the inorganic layer and heated.
(FR) La présente invention traite le problème consistant à fournir : un nouveau film barrière contre les gaz ayant une durabilité élevée et une bonne productivité ; et un procédé pour produire le film barrière contre les gaz. Un film barrière contre les gaz selon la présente invention comprend un corps de support, ainsi qu'une couche inorganique et un film de résine qui sont supportés par le corps de support, dans cet ordre. Le film de résine a un groupe hydroxyle ; la couche inorganique et le film de résine sont directement liés l'un à l'autre, tout en ayant partiellement une partie séparée au niveau de l'interface ; et le film barrière contre les gaz a une ou plusieurs combinaisons de la couche inorganique et du film de résine. Dans un procédé de production d'un film barrière contre les gaz selon la présente invention, après la formation d'une couche inorganique par un procédé de dépôt en phase vapeur, un film de résine ayant un groupe hydroxyle est stratifié sur la couche inorganique et chauffé.
(JA) 耐久性が高く、生産性も良好な新規なガスバリアフィルム、および、このガスバリアフィルムの製造方法の提供を課題とする。ガスバリアフィルムは、支持体と、支持体に支持される、無機層と、樹脂フィルムと、をこの順に有し、樹脂フィルムが水酸基を有し、無機層と、樹脂フィルムとが、界面に部分的に離間部を有して直接接合され、無機層と樹脂フィルムとの組み合わせを、1組以上有する。ガスバリアフィルムの製造方法は、気相成膜法で無機層を形成した後、無機層に水酸基を有する樹脂フィルムを積層して、加熱する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)