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1. (WO2019049600) PRODUCTION METHOD FOR VAPOR DEPOSITION MASK DEVICE AND PRODUCTION DEVICE FOR VAPOR DEPOSITION MASK DEVICE
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Pub. No.: WO/2019/049600 International Application No.: PCT/JP2018/029845
Publication Date: 14.03.2019 International Filing Date: 08.08.2018
IPC:
C23C 14/04 (2006.01) ,H05B 33/10 (2006.01) ,H01L 51/50 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
Applicants:
大日本印刷株式会社 DAI NIPPON PRINTING CO., LTD. [JP/JP]; 東京都新宿区市谷加賀町一丁目1番1号 1-1, Ichigaya-kaga-cho 1-chome, Shinjuku-ku, Tokyo 1628001, JP
Inventors:
岡本 英介 OKAMOTO Hideyuki; JP
Agent:
永井 浩之 NAGAI Hiroshi; JP
中村 行孝 NAKAMURA Yukitaka; JP
佐藤 泰和 SATO Yasukazu; JP
朝倉 悟 ASAKURA Satoru; JP
堀田 幸裕 HOTTA Yukihiro; JP
塙 和也 HANAWA Kazuya; JP
Priority Data:
2017-17046905.09.2017JP
Title (EN) PRODUCTION METHOD FOR VAPOR DEPOSITION MASK DEVICE AND PRODUCTION DEVICE FOR VAPOR DEPOSITION MASK DEVICE
(FR) PROCÉDÉ ET DISPOSITIF DE PRODUCTION POUR DISPOSITIF DE MASQUE DE DÉPÔT EN PHASE VAPEUR
(JA) 蒸着マスク装置の製造方法及び蒸着マスク装置の製造装置
Abstract:
(EN) This production method for a vapor deposition mask device comprises a step for preparing a vapor deposition mask including a plurality of through-holes extending from a first surface to a second surface, and a welding step for welding the vapor deposition mask on surfaces of a frame including a front surface and a back surface facing the front surface.
(FR) La présente invention concerne un procédé de production de dispositif de masque de dépôt en phase vapeur comprenant une étape de préparation d'un masque de dépôt en phase vapeur comportant une pluralité de trous traversants s'étendant d'une première surface à une seconde surface, et une étape de soudage destinée à souder le masque de dépôt en phase vapeur sur des surfaces d'un cadre, comprenant une surface avant et une surface arrière faisant face à la surface avant.
(JA) 蒸着マスク装置の製造方法は、第1面から第2面に至る複数の貫通孔を含む蒸着マスクを準備する準備工程と、表面と表面に対向する裏面とを含むフレームの表面に、蒸着マスクを溶接する溶接工程と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)