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1. (WO2019049463) STEREOLITHOGRAPHY COMPOSITION
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Pub. No.: WO/2019/049463 International Application No.: PCT/JP2018/023281
Publication Date: 14.03.2019 International Filing Date: 19.06.2018
IPC:
C08F 2/46 (2006.01) ,C08F 220/10 (2006.01) ,C08F 220/58 (2006.01) ,C08F 226/02 (2006.01) ,C08F 292/00 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
52
Amides or imides
54
Amides
58
containing oxygen in addition to the carbonamido oxygen
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
226
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
02
by a single or double bond to nitrogen
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
292
Macromolecular compounds obtained by polymerising monomers on to inorganic materials
Applicants:
株式会社エンプラス ENPLAS CORPORATION [JP/JP]; 埼玉県川口市並木2丁目30番1号 30-1, Namiki 2-chome, Kawaguchi-shi, Saitama 3320034, JP
Inventors:
上本 紘平 JOHMOTO, Kohei; JP
石田 毅一郎 ISHIDA, Kiichiro; JP
小橋 一輝 KOBASHI, Itsuki; JP
Agent:
特許業務法人大貫小竹国際特許事務所 OHNUKI & KOTAKE; 東京都千代田区神田須田町二丁目25番地 山崎須田町ビル5階 Yamasakisudacho-Building 5th floor, 25, Kandasudacho 2-chome, Chiyoda-ku, Tokyo 1010041, JP
Priority Data:
2017-17049805.09.2017JP
2018-09185711.05.2018JP
Title (EN) STEREOLITHOGRAPHY COMPOSITION
(FR) COMPOSITION DE STÉRÉOLITHOGRAPHIE
(JA) 光造形用組成物
Abstract:
(EN) [Problem] To provide a stereolithography composition capable of improving the mechanical properties of a formed object in a high temperature environment and of sufficiently reducing viscosity during formation. [Solution] A stereolithography composition comprises a photocurable resin, an inorganic filler, and an additive which is a compound having an amide bond and a C=C unsaturated double bond in the molecule. The additive is preferably selected from an N-vinylformamide and a 4-acryloylmorpholine. The inorganic filler is preferably a layered silicate compound such as talc, silica, or mica. The above enables the formed object to have a storage modulus of 2000 MPa or higher in a high temperature environment and enables the viscosity during formation to be less than 2000 mPa∙s.
(FR) Le problème à la base de la présente invention concerne une composition de stéréolithographie en mesure d'améliorer les propriétés mécaniques d'un objet formé dans un environnement à haute température et de réduire suffisamment la viscosité pendant la formation. La solution selon l'invention porte sur une composition de stéréolithographie qui comprend une résine photodurcissable, une charge inorganique et un additif qui est un composé présentant une liaison amide et une double liaison C=C insaturée dans la molécule. L'additif est de préférence choisi parmi le N-vinylformamide et la 4-acryloylmorpholine. La charge inorganique est de préférence un composé de silicate à couches tel que le talc, la silice ou le mica. Le procédé ci-dessus permet à l'objet formé de présenter un module de conservation de 2000 MPa ou plus dans un environnement à haute température et permet à la viscosité pendant la formation d'être inférieure à 2000 mPa∙s.
(JA) 【課題】造形物において高温環境下での機械的物性を高くでき、且つ、造形時においては、粘度を十分に低くすることが可能な光造形用組成物を提供する。 【解決手段】光造形用組成物は、光硬化性樹脂と、無機フィラーと、分子中にアミド結合及びC=C不飽和二重結合を有する化合物である添加剤と、を含む。添加剤としては、N-ビニルホルムアミド、及び、4-アクリロモルホリンから選択するとよい。また、無機フィラーとしては、タルク、シリカ、マイカ等の層状ケイ酸塩化合物を用いるとよい。造形物の高温環境下において、貯蔵弾性率を2000MPa以上とすることができ、また、造形時において、粘度を2000mPa・s未満とすることが可能となる。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)