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1. (WO2019049453) DEPOSITION MASK, METHOD FOR MANUFACTURING DEPOSITION MASK, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
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Pub. No.: WO/2019/049453 International Application No.: PCT/JP2018/022525
Publication Date: 14.03.2019 International Filing Date: 13.06.2018
IPC:
C23C 14/04 (2006.01) ,H05B 33/10 (2006.01) ,H01L 51/50 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
Applicants:
株式会社ジャパンディスプレイ JAPAN DISPLAY INC. [JP/JP]; 東京都港区西新橋三丁目7番1号 3-7-1 Nishi-shinbashi, Minato-ku, Tokyo 1050003, JP
Inventors:
觀田 康克 KANDA Noriyoshi; JP
木村 泰一 KIMURA Yasukazu; JP
平賀 健太 HIRAGA Kenta; JP
松浦 由紀 MATSUURA Yuki; JP
Agent:
特許業務法人高橋・林アンドパートナーズ TAKAHASHI, HAYASHI AND PARTNER PATENT ATTORNEYS, INC.; 東京都大田区蒲田5-24-2 損保ジャパン日本興亜蒲田ビル9階 Sonpo Japan Nipponkoa Kamata Building 9F, 5-24-2 Kamata, Ota-ku, Tokyo 1440052, JP
Priority Data:
2017-17182907.09.2017JP
Title (EN) DEPOSITION MASK, METHOD FOR MANUFACTURING DEPOSITION MASK, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
(FR) MASQUE DE DÉPÔT, PROCÉDÉ DE PRODUCTION DE MASQUE DE DÉPÔT, ET PROCÉDÉ DE PRODUCTION DE DISPOSITIF D’AFFICHAGE
(JA) 蒸着マスク、蒸着マスクの作製方法、および表示装置の製造方法
Abstract:
(EN) The present invention provides a deposition mask. The deposition mask has a metal plate that has: an upper surface; a lower surface, which is positioned below the upper surface, and which is disposed further than the upper surface from a substrate to be subjected to deposition; and an opening penetrating from the upper surface to the lower surface. The side wall of the opening has a first surface, and a second surface positioned below the first surface. A first angle formed between the first surface and the upper surface is larger than a second angle formed between the second surface and the upper surface. The first angle and the second angle are larger than 0° but smaller than 90°.
(FR) La présente invention concerne un masque de dépôt. Le masque de dépôt comporte une plaque métallique qui comporte : une surface supérieure ; une surface inférieure, qui est positionnée au-dessous de la surface supérieure, et qui est disposée plus loin que la surface supérieure d'un substrat devant être soumis à un dépôt ; et une ouverture pénétrant de la surface supérieure à la surface inférieure. La paroi latérale de l'ouverture a une première surface, et une seconde surface positionnée au-dessous de la première surface. Un premier angle formé entre la première surface et la surface supérieure est supérieur à un second angle formé entre la seconde surface et la surface supérieure. Le premier angle et le second angle sont supérieurs à 0° mais inférieurs à 90°.
(JA) 【解決手段】蒸着マスクが提供される。蒸着マスクは、上面と、上面の下に位置し、蒸着に供される基板に対して上面よりも遠くに配置される下面と、上面から下面へ貫通する開口とを有する金属板を有する。開口の側壁は第1の面、および第1の面の下に位置する第2の面を有する。第1の面と上面がなす第1の角度は、第2の面と上面がなす第2の角度よりも大きい。第1の角度と第2の角度は、0°よりも大きく、90°よりも小さい。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)