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1. (WO2019049414) MAGNETIC SENSOR AND CURRENT SENSOR PROVIDED WITH SAME
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Pub. No.: WO/2019/049414 International Application No.: PCT/JP2018/015643
Publication Date: 14.03.2019 International Filing Date: 16.04.2018
IPC:
G01R 33/09 (2006.01) ,G01R 15/20 (2006.01) ,H01L 43/08 (2006.01)
G PHYSICS
01
MEASURING; TESTING
R
MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
33
Arrangements or instruments for measuring magnetic variables
02
Measuring direction or magnitude of magnetic fields or magnetic flux
06
using galvano-magnetic devices
09
Magneto-resistive devices
G PHYSICS
01
MEASURING; TESTING
R
MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
15
Details of measuring arrangements of the types provided for in groups G01R17/-G01R29/, G01R33/-G01R33/26176
14
Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
20
using galvano-magnetic devices, e.g. Hall-effect devices
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
43
Devices using galvano-magnetic or similar magnetic effects; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof
08
Magnetic-field-controlled resistors
Applicants:
株式会社村田製作所 MURATA MANUFACTURING CO., LTD. [JP/JP]; 京都府長岡京市東神足1丁目10番1号 10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto 6178555, JP
Inventors:
川浪 崇 KAWANAMI, Takashi; JP
Agent:
特許業務法人深見特許事務所 FUKAMI PATENT OFFICE, P.C.; 大阪府大阪市北区中之島三丁目2番4号 中之島フェスティバルタワー・ウエスト Nakanoshima Festival Tower West, 2-4, Nakanoshima 3-chome, Kita-ku, Osaka-shi, Osaka 5300005, JP
Priority Data:
2017-17225907.09.2017JP
Title (EN) MAGNETIC SENSOR AND CURRENT SENSOR PROVIDED WITH SAME
(FR) CAPTEUR MAGNÉTIQUE ET CAPTEUR DE COURANT COMPRENANT CE DERNIER
(JA) 磁気センサおよびそれを備える電流センサ
Abstract:
(EN) This magnetic sensor is provided with a magnetosensitive element section (11), a first magnet section (13), and a second magnet section (14). The direction of a bias magnetic field (1) is substantially orthogonal to the sensitivity axis direction in a magnetosensitive surface (11s). The first magnet section (13) has a main outgoing surface section (13m). The second magnet section (14) has a main incident surface section (14m). The magnetosensitive element section (11) is disposed such that the magnetosensitive surface (11s) is positioned outside of a facing region (Tm) sandwiched between the main outgoing surface section (13m) and the main incident surface section (14m).
(FR) L'invention concerne un capteur magnétique comprenant une section d'élément magnétosensible (11), une première section d'aimant (13) et une seconde section d'aimant (14). La direction d'un champ magnétique de polarisation (1) est sensiblement orthogonale à la direction de l'axe de sensibilité dans une surface magnétosensible (11s). La première section d'aimant (13) possède une section de surface sortante principale (13m). La seconde section d'aimant (14) possède une section de surface d'incidence principale (14m). La section d'élément magnétosensible (11) est disposée de telle sorte que la surface magnétosensible (11s) soit positionnée à l'extérieur d'une zone de face (Tm) prise en sandwich entre la section de surface sortante principale (13m) et la section de surface d'incidence principale (14m).
(JA) 磁気センサは、感磁素子部(11)と、第1磁石部(13)および第2磁石部(14)とを備える。バイアス磁界(1)の向きは、感磁面(11s)内において感度軸方向と略直交している。第1磁石部(13)は、主出射面部(13m)を有する。第2磁石部(14)は、主入射面部(14m)を有する。感磁素子部(11)は、感磁面(11s)が主出射面部(13m)と主入射面部(14m)とに挟まれた対向領域(Tm)外に位置するように、配置されている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)