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1. (WO2019049261) ELECTRON GUN AND ELECTRON BEAM APPLICATION DEVICE
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Pub. No.: WO/2019/049261 International Application No.: PCT/JP2017/032276
Publication Date: 14.03.2019 International Filing Date: 07.09.2017
IPC:
H01J 37/06 (2006.01) ,H01J 37/141 (2006.01) ,H01J 37/244 (2006.01) ,H01J 37/248 (2006.01) ,H01J 37/28 (2006.01) ,H01J 37/295 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06
Electron sources; Electron guns
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
04
Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
10
Lenses
14
magnetic
141
Electromagnetic lenses
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
244
Detectors; Associated components or circuits therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
248
Components associated with high voltage supply
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
28
with scanning beams
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26
Electron or ion microscopes; Electron- or ion-diffraction tubes
295
Electron- or ion-diffraction tubes
Applicants:
株式会社日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP/JP]; 東京都港区西新橋一丁目24番14号 24-14, Nishi Shimbashi 1-chome, Minato-ku, Tokyo 1058717, JP
Inventors:
松永 宗一郎 MATSUNAGA Soichiro; JP
早田 康成 SOHDA Yasunari; JP
片桐 創一 KATAGIRI Souichi; JP
榊原 慎 SAKAKIBARA Makoto; JP
川野 源 KAWANO Hajime; JP
土肥 隆 DOI Takashi; JP
Agent:
ポレール特許業務法人 POLAIRE I.P.C.; 東京都中央区日本橋茅場町二丁目13番11号 13-11, Nihonbashikayabacho 2-chome, Chuo-ku, Tokyo 1030025, JP
Priority Data:
Title (EN) ELECTRON GUN AND ELECTRON BEAM APPLICATION DEVICE
(FR) CANON À ÉLECTRONS ET DISPOSITIF D'APPLICATION DE FAISCEAU D'ÉLECTRONS
(JA) 電子銃および電子ビーム応用装置
Abstract:
(EN) In order to provide an electron gun, wherein the spot diameter of a beam converged on a sample can be maintained small even if a probe current applied to the sample is increased, a magnetic field generation source (301) is provided with respect to an electron gun having: an electron source (101); an extraction electrode (102) for extracting electrons from the electron source (101); an acceleration electrode (103) for accelerating the electrons extracted from the electron source (101); and a first coil (104) and a first magnetic path (201) having an opening on the electron source side, said first coil and first magnetic path forming a control lens for converging an electron beam outputted from the acceleration electrode (103). The magnetic field generation source is provided for the purpose of cancelling, at the installation position of the electron source (101), a magnetic field generated due to the first coil (104) and the first magnetic path (201).
(FR) Afin de pourvoir à un canon à électrons dans lequel le diamètre du point d'impact d'un faisceau fait converger sur un échantillon puisse rester petit même si un courant de sonde appliqué à l'échantillon est augmenté, l'invention porte sur une source de génération de champ magnétique (301) relativement à un canon à électrons comportant : une source d'électrons (101) ; une électrode d'extraction (102) pour extraire des électrons de la source d'électrons (101) ; une électrode d'accélération (103) pour accélérer les électrons extraits de la source d'électrons (101) ; et une première bobine (104) et un premier chemin magnétique (201) comportant une ouverture du côté de la source d'électrons, ladite première bobine et ledit premier chemin magnétique formant une lentille de commande servant à faire converger un faisceau d'électrons émis à partir de l'électrode d'accélération (103). La source de génération de champ magnétique est prévue dans le but d'annuler, à la position d'installation de la source d'électrons (101), un champ magnétique généré en raison de la première bobine (104) et du premier chemin magnétique (201).
(JA) 試料に照射するプローブ電流を大きくしても、試料上に収束するビームのスポット径を小さく維持できる電子銃を実現するため、電子源(101)と、電子源(101)から電子を引き出す引出電極(102)と、電子源(101)から引き出された電子を加速させる加速電極(103)と、加速電極(103)から放出される電子ビームを収束させる制御レンズを形成する第1コイル(104)及び電子源側に開口を有する第1磁路(201)を有する電子銃に対して、電子源(101)の設置位置において第1コイル(104)及び第1磁路(201)により発生される磁場を打ち消すための磁場発生源(301)を設ける。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)