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1. (WO2019049254) CYLINDRICAL SPUTTERING TARGET
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Pub. No.: WO/2019/049254 International Application No.: PCT/JP2017/032230
Publication Date: 14.03.2019 International Filing Date: 07.09.2017
IPC:
C23C 14/34 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
Applicants:
三菱マテリアル株式会社 MITSUBISHI MATERIALS CORPORATION [JP/JP]; 東京都千代田区大手町一丁目3番2号 3-2, Otemachi 1-chome, Chiyoda-ku, Tokyo 1008117, JP
Inventors:
植田 稔晃 UEDA Toshiaki; JP
岡野 晋 OKANO Shin; JP
Agent:
松沼 泰史 MATSUNUMA Yasushi; JP
寺本 光生 TERAMOTO Mitsuo; JP
細川 文広 HOSOKAWA Fumihiro; JP
大浪 一徳 ONAMI Kazunori; JP
Priority Data:
Title (EN) CYLINDRICAL SPUTTERING TARGET
(FR) CIBLE DE PULVÉRISATION CYLINDRIQUE
(JA) 円筒型スパッタリングターゲット
Abstract:
(EN) The cylindrical sputtering target according to the present invention is provided with a cylindrical-shaped target member and a packing tube that is joined via a joining layer to the inner circumferential side of the target member. Thermal resistance in the radial direction of the packing tube is 6.5 x 10-5 K/W or less.
(FR) La cible de pulvérisation cylindrique selon la présente invention est pourvue d'un élément cible de forme cylindrique et d'un tube d'emballage qui est relié par l'intermédiaire d'une couche de jonction au côté circonférentiel interne de l'élément cible. La résistance thermique dans la direction radiale du tube d'emballage est inférieure ou égale à 6,5 x 10-5 K/W.
(JA) 本発明の円筒型スパッタリングターゲットは、円筒形状をなすターゲット材と、このターゲット材の内周側に接合層を介して接合されたバッキングチューブと、を備え、前記バッキングチューブにおける径方向の熱抵抗が6.5×10-5K/W以下とされている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)