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1. (WO2019049219) SUBSTRATE ROTATING DEVICE AND SUBSTRATE PROCESSING DEVICE
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Pub. No.: WO/2019/049219 International Application No.: PCT/JP2017/032008
Publication Date: 14.03.2019 International Filing Date: 05.09.2017
IPC:
H01L 21/683 (2006.01) ,F16H 49/00 (2006.01) ,H01L 21/027 (2006.01) ,H01L 21/304 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
H
GEARING
49
Other gearing
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
Applicants:
倉敷紡績株式会社 KURASHIKI BOSEKI KABUSHIKI KAISHA [JP/JP]; 岡山県倉敷市本町7番1号 7-1, Hommachi, Kurashiki-shi, Okayama 7100054, JP
Inventors:
横田 博 YOKOTA, Hiroshi; JP
樋川 英昭 HIKAWA, Hideaki; JP
Agent:
河原 哲郎 KAWAHARA, Tetsuro; JP
Priority Data:
Title (EN) SUBSTRATE ROTATING DEVICE AND SUBSTRATE PROCESSING DEVICE
(FR) DISPOSITIF DE ROTATION DE SUBSTRAT ET DISPOSITIF DE TRAITEMENT DE SUBSTRAT
(JA) 基板回転装置および基板処理装置
Abstract:
(EN) [Problem] To provide a substrate rotating device with which a contamination source in a container can be reduced and which is easier to maintain. [Solution] A substrate rotating device 10 comprises: an outer frame body 20 which is provided with a magnetic field generating means and which can cause a generated magnetic field to rotate about a central axis; a container 40 disposed on the inside of the outer frame body; an inner frame body 50 which is disposed in the container and is provided with a substrate 60 holding means and circumferentially distributed magnets or ferromagnetic materials; a magnetic coupling means which magnetically couples the outer frame body with the inner frame body to cause the inner frame body to float, and which causes the inner frame body to rotate so as to follow a rotational change in the magnetic field; and a gap adjusting means which keeps a constant interval between the outer frame body and the inner frame body, and which maintains the inner frame body concentric with the outer frame body.
(FR) Le problème décrit par la présente invention est de pourvoir à un dispositif de rotation de substrat avec lequel une source de contamination dans un contenant puisse être réduite et qui soit plus facile à entretenir. La solution selon l'invention porte sur un dispositif de rotation de substrat 10 qui comprend : un corps de structure externe 20 qui est pourvu d'un moyen de génération de champ magnétique et qui peut faire tourner autour d'un axe central un champ magnétique généré ; un contenant 40 disposé à l'intérieur du corps de structure externe ; un corps de structure interne 50 qui est disposé dans le contenant et est pourvu d'un moyen de retenue de substrat 60 et d'aimants ou de matériaux ferromagnétiques répartis de manière circonférentielle ; un moyen de couplage magnétique qui couple magnétiquement le corps de structure externe au corps de structure interne pour faire flotter le corps de structure interne, et qui fait tourner le corps de structure interne de manière à suivre la variation rotative du champ magnétique ; et un moyen d'ajustement d'écartement qui maintient un intervalle constant entre le corps de structure externe et le corps de structure interne, et qui maintient le corps de structure interne concentrique avec le corps de structure externe.
(JA) [課題]容器内の汚染源を減らし、より保守が容易な基板回転装置を提供すること。 [解決手段]磁場発生手段を備え、発生した磁場を中心軸の周りに回転可能な外枠体20と、前記外枠体の内側に配置された容器40と、前記容器内に配置され、基板60保持手段と周方向に分散配置された磁石または強磁性体とを備える内枠体50と、前記外枠体と前記内枠体を磁気的に結合して、該内枠体を浮上させるとともに、該内枠体を前記磁場の回転変化に追随させて回転させる磁気結合手段と、前記外枠体と前記内枠体の間隔を一定に保ち、該内枠体を該外枠体と同心に維持するギャップ調整手段とを有する基板回転装置10。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)