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1. (WO2019048633) MOULD FOR NANOIMPRINT LITHOGRAPHY
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Pub. No.: WO/2019/048633 International Application No.: PCT/EP2018/074193
Publication Date: 14.03.2019 International Filing Date: 07.09.2018
IPC:
G03F 7/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Applicants:
LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST) [LU/LU]; 5, avenue des Hauts-Fourneaux 4362 Esch-sur-Alzette, LU
Inventors:
SPIRITO, David; BE
LENOBLE, Damien; BE
Agent:
LECOMTE & PARTNERS; P.O. Box 1623 1016 Luxembourg, LU
Priority Data:
LU10043307.09.2017LU
Title (EN) MOULD FOR NANOIMPRINT LITHOGRAPHY
(FR) MOULE POUR LITHOGRAPHIE PAR NANO-IMPRESSION
Abstract:
(EN) The invention is directed to nanoimprint lithography mould (1) comprising: a body (2) and a plurality of protrusions (3) extending from the body (2), each protrusion (3) having a proximal area at its proximal end (3.1) and a distal area at its distal end (3.2), away from the body (2), wherein the distal area is smaller than or equal to a quarter of the proximal area.
(FR) L'invention concerne un moule de lithographie par nano-impression (1) comprenant : un corps (2) et une pluralité de saillies (3) s'étendant à partir du corps (2), chaque saillie (3) ayant une zone proximale au niveau de son extrémité proximale (3.1) et une zone distale au niveau de son extrémité distale (3.2), à l'opposé du corps (2), la zone distale étant inférieure ou égale à un quart de la zone proximale.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)