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1. (WO2019048506) TRAINING METHODS FOR MACHINE LEARNING ASSISTED OPTICAL PROXIMITY ERROR CORRECTION
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Pub. No.: WO/2019/048506 International Application No.: PCT/EP2018/073914
Publication Date: 14.03.2019 International Filing Date: 05.09.2018
IPC:
G03F 7/20 (2006.01) ,G03F 1/36 (2012.01) ,G06F 17/50 (2006.01) ,G06N 99/00
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
36
Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
17
Digital computing or data processing equipment or methods, specially adapted for specific functions
50
Computer-aided design
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
N
COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS
99
Subject matter not provided for in other groups of this subclass
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
SU, Jing; US
LU, Yen-Wen; US
LUO, Ya; US
Agent:
PETERS, John; NL
Priority Data:
62/556,24608.09.2017US
62/725,73431.08.2018US
Title (EN) TRAINING METHODS FOR MACHINE LEARNING ASSISTED OPTICAL PROXIMITY ERROR CORRECTION
(FR) PROCÉDÉS D'APPRENTISSAGE DE CORRECTION OPTIQUE D'ERREUR DE PROXIMITÉ ASSISTÉE PAR APPRENTISSAGE AUTOMATIQUE
Abstract:
(EN) A method including: obtaining an optical proximity correction for a spatially shifted version of a training design pattern (5000); and training a machine learning model (5200) configured to predict optical proximity corrections for design patterns using data (5051; 5053) regarding the spatially shifted version of the training design pattern and data (5041; 5043) based on the optical proximity corrections for the spatially shifted version of the training design pattern.
(FR) L'invention concerne un procédé qui comprend les étapes suivantes : obtention d'une correction optique de proximité pour une version décalée dans l'espace d'un motif de conception d'apprentissage (5000); et apprentissage d'un modèle d'apprentissage automatique (5200) configuré afin de prédire des corrections optiques de proximité pour des motifs de conception à l'aide de données (5051; 5053) concernant la version décalée dans l'espace du motif de conception d'apprentissage et des données (5041; 5043) sur la base des corrections optiques de proximité pour la version décalée dans l'espace du motif de conception d'apprentissage.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)