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1. (WO2019048252) DIFFRACTION GRATING FOR X-RAY PHASE CONTRAST AND/OR DARK-FIELD IMAGING
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Pub. No.: WO/2019/048252 International Application No.: PCT/EP2018/072833
Publication Date: 14.03.2019 International Filing Date: 24.08.2018
IPC:
G01N 23/20 (2018.01) ,A61B 6/00 (2006.01) ,G01J 3/18 (2006.01) ,G01N 23/04 (2018.01) ,G01N 23/20008 (2018.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23
Investigating or analysing materials by the use of wave or particle radiation not covered by group G01N21/ or G01N22/159
20
by using diffraction of the radiation, e.g. for investigating crystal structure; by using reflection of the radiation
A HUMAN NECESSITIES
61
MEDICAL OR VETERINARY SCIENCE; HYGIENE
B
DIAGNOSIS; SURGERY; IDENTIFICATION
6
Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
G PHYSICS
01
MEASURING; TESTING
J
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
3
Spectrometry; Spectrophotometry; Monochromators; Measuring colours
12
Generating the spectrum; Monochromators
18
using diffraction elements, e.g. grating
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23
Investigating or analysing materials by the use of wave or particle radiation not covered by group G01N21/ or G01N22/159
02
by transmitting the radiation through the material
04
and forming a picture
[IPC code unknown for ERROR IPC Code incorrect: invalid subgroup (0=>999999)!]
Applicants:
KONINKLIJKE PHILIPS N.V. [NL/NL]; High Tech Campus 5 5656 AE Eindhoven, NL
Inventors:
KOEHLER, Thomas; NL
Agent:
VERSTEEG, Dennis John; NL
DE HAAN, Poul, Erik; NL
Priority Data:
17189540.206.09.2017EP
Title (EN) DIFFRACTION GRATING FOR X-RAY PHASE CONTRAST AND/OR DARK-FIELD IMAGING
(FR) RÉSEAU DE DIFFRACTION POUR IMAGERIE À RAYONS X EN CONTRASTE DE PHASE ET/OU SUR FOND NOIR
Abstract:
(EN) The present invention relates to a grating for X-ray phase contrast and/or dark-field imaging. It is described to form a photo-resist layer on a surface of a substrate. The photo-resist layer is illuminated with radiation using a mask representing a desired grating structure. The photo-resist layer is etched to remove parts of the photo-resist layer, to leave a plurality of trenches that are laterally spaced from one across the surface of the substrate. A plurality of material layers are formed on the surface of the substrate. Each layer is formed in a trench. A material layer comprises a plurality of materials, wherein the plurality of materials are formed one on top of the other in a direction perpendicular to the surface of the substrate. The plurality of materials comprises at least one material that has a k-edge absorption energy that is higher than the k-edge absorption energy of Gold and the plurality of materials comprises Gold.
(FR) La présente invention concerne un réseau de diffraction pour imagerie à rayons X en contraste de phase et/ou sur fond noir. L'invention décrit la formation d'une couche de résine photosensible sur une surface d'un substrat. La couche de résine photosensible est éclairée par un rayonnement en utilisant un masque qui représente une structure de réseau souhaitée. La couche de résine photosensible est gravée pour éliminer des parties de la couche de résine photosensible, afin de laisser une pluralité de tranchées qui sont espacées latéralement les unes des autres à travers la surface du substrat. Une pluralité de couches de matériau sont formées sur la surface du substrat. Chaque couche est formée dans une tranchée. Une couche de matériau comprend une pluralité de matériaux, la pluralité de matériaux étant formés les uns au-dessus des autres dans une direction perpendiculaire à la surface du substrat. La pluralité de matériaux comprend au moins un matériau qui présente une énergie d'absorption de bord k qui est supérieure à l'énergie d'absorption de bord k de l'or et la pluralité de matériaux comprend de l'or.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)