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1. (WO2019048221) METHOD AND DEVICE FOR ANALYSING A GAS
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Pub. No.: WO/2019/048221 International Application No.: PCT/EP2018/072401
Publication Date: 14.03.2019 International Filing Date: 20.08.2018
IPC:
G01N 27/12 (2006.01) ,G01N 33/00 (2006.01) ,G01N 27/14 (2006.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
27
Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means
02
by investigating impedance
04
by investigating resistance
12
of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
33
Investigating or analysing materials by specific methods not covered by groups G01N1/-G01N31/131
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
27
Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means
02
by investigating impedance
04
by investigating resistance
14
of an electrically-heated body in dependence upon change of temperature
Applicants:
ROBERT BOSCH GMBH [DE/DE]; Postfach 30 02 20 70442 Stuttgart, DE
Inventors:
NOLTE, Philipp; DE
BRUESER, Christoph; DE
MARTINEZ PRADA, Maria; DE
CLAUS, Thomas; DE
Priority Data:
10 2017 215 529.905.09.2017DE
Title (EN) METHOD AND DEVICE FOR ANALYSING A GAS
(FR) PROCÉDÉ ET DISPOSITIF POUR ANALYSER UN GAZ
(DE) VERFAHREN UND VORRICHTUNG ZUM ANALYSIEREN EINES GASES
Abstract:
(EN) The invention relates to a method for analysing a gas, in which a sensitive layer (2) containing metal oxide is exposed to the gas, comprising the steps of: reducing the temperature of the sensitive layer (2) from a first temperature (T1) to a second temperature (T2), the temperature of the sensitive layer (2) being kept substantially at the second temperature for a predetermined time period (D2); increasing the temperature of the sensitive layer (2) to a third temperature (T3), measuring at least one electrical resistance value of the sensitive layer (2), whilst the sensitive layer (2) exhibits substantially the third temperature; and analysing components of the gas by means of the measured at least one electrical resistance value.
(FR) La présente invention concerne un procédé pour analyser un gaz, une couche sensible (2) contenant un oxyde métallique étant exposée au gaz, comprenant les étapes consistant à : diminuer la température de la couche sensible (2) pour passer d'une première température (T1) à une deuxième température (T2), la température de la couche sensible (2) étant maintenue sensiblement à la deuxième température pendant une période prédéterminée (D2) ; augmenter la température de la couche sensible (2) jusqu'à une troisième température (T3) ; mesurer au moins une valeur de résistance électrique de la couche sensible (2) tandis que la couche sensible (2) présente sensiblement la troisième température ; et analyser les composants du gaz d'après la ou les valeurs de résistance électrique mesurées.
(DE) Die Erfindung betrifft ein Verfahren zum Analysieren eines Gases, wobei eine sensitive metalloxidhaltige Schicht (2) dem Gas ausgesetzt wird, mit den Schritten: Verringern der Temperatur der sensitiven Schicht (2) von einer ersten Temperatur (T1) auf eine zweite Temperatur (T2), wobei die Temperatur der sensitiven Schicht (2) für einen vorgegebenen Zeitraum (D2) im Wesentlichen bei der zweiten Temperatur gehalten wird; Erhöhen der Temperatur der sensitiven Schicht (2) auf eine dritte Temperatur (T3); Messen von mindestens einem elektrischen Widerstandswert der sensitiven Schicht (2), während die sensitive Schicht (2) im Wesentlichen die dritte Temperatur aufweist; und Analysieren von Komponenten des Gases anhand des gemessenen mindestens einen elektrischen Widerstandswertes.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)