Processing

Please wait...

Settings

Settings

Goto Application

1. WO2019048191 - OPTICAL SYSTEM, OPTICAL ASSEMBLY, AND LITHOGRAPHY UNIT

Publication Number WO/2019/048191
Publication Date 14.03.2019
International Application No. PCT/EP2018/071944
International Filing Date 13.08.2018
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02B 17/06 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
02Catoptric systems, e.g. image erecting and reversing system
06using mirrors only
CPC
G02B 27/108
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
10Beam splitting or combining systems
108for sampling a portion of a beam or combining a small beam in a larger one, e.g. wherein the area ratio or power ratio of the divided beams significantly differs from unity, without spectral selectivity
G02B 5/005
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
005Diaphragms
G02B 5/0891
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
0891Ultraviolet [UV] mirrors
G02B 7/003
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
003Alignment of optical elements
G03F 7/70233
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70233Optical aspects of catoptric systems
G03F 7/7025
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
7025Size or form of projection system aperture
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • DEUFEL, Peter
  • XALTER, Stefan
  • KULITZKI, Viktor
Agents
  • HORN KLEIMANN WAITZHOFER PATENTANWÄLTE PARTG MBB
Priority Data
10 2017 215 544.205.09.2017DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) OPTISCHES SYSTEM, OPTISCHE ANORDNUNG UND LITHOGRAPHIEANLAGE
(EN) OPTICAL SYSTEM, OPTICAL ASSEMBLY, AND LITHOGRAPHY UNIT
(FR) SYSTÈME OPTIQUE, DISPOSITIF OPTIQUE ET INSTALLATION DE LITHOGRAPHIE
Abstract
(DE)
Offenbart wird ein optisches System (200) für eine Lithographieanlage (100A, 100B), mit einem ersten Spiegel (202), einem zweiten Spiegel (206), der einen Strahlengang (204) zusammen mit dem ersten Spiegel (202) definiert und ferner einen Durchbruch (208) aufweist, wobei das optische System (200) dazu eingerichtet ist, dass Arbeitslicht (210) durch den Durchbruch (208) auf den ersten Spiegel (202) fällt, wobei Arbeitslicht (210) von dem ersten Spiegel (202) auf den zweiten Spiegel (206) und von dem zweiten Spiegel (206) zu einem Zielobjekt (212) reflektierbar ist, einer Obskurationsblende (222), welche innerhalb des Strahlengangs (204) zwischen dem ersten Spiegel (202) und dem zweiten Spiegel (206) angeordnet ist, und einer Aperturblende (224), welche ein erstes Aperturblendensegment (226) und ein zweites Aperturblendensegment (228) aufweist, wobei das erste Aperturblendensegment (226) dazu eingerichtet ist, teilumfänglich Arbeitslicht (210), das von dem ersten Spiegel (202) zu dem zweiten Spiegel (206) reflektierbar ist, und das zweite Aperturblendensegment (228) dazu eingerichtet ist, teilumfänglich Arbeitslicht (210), das von dem zweiten Spiegel (206) zu dem Zielobjekt (212) reflektierbar ist, abzuschatten, wobei das erste Aperturblendensegment (226) und das zweite Aperturblendensegment (228) in Richtung (R1) von dem ersten Spiegel (202) zu dem zweiten Spiegel (206) beabstandet voneinander sind.
(EN)
The invention relates to an optical system (200) for a lithography unit (100A, 100B), having: a first mirror (202); a second mirror (206) which, together with the first mirror (202), defines a beam path (204) and also has a hole (208), the optical system (200) being designed such that working light (210) falls through the hole (208) onto the first mirror (202), working light (210) being reflectable from the first mirror (202) onto the second mirror (206) and from the second mirror (206) to a target object (212); an obscuring diaphragm (222) which is situated in the beam path (204) between the first mirror (202) and the second mirror (206); and an aperture diaphragm (224) which has a first aperture diaphragm segment (226) and a second aperture diaphragm segment (228). The first aperture diaphragm segment (226) is designed to partially shadow working light (210) which is reflectable from the first mirror (202) to the second mirror (206), and the second aperture diaphragm segment (228) is designed to partially shadow working light (210) which is reflectable from the second mirror (206) to the target object (212). The first aperture diaphragm segment (226) and the second aperture diaphragm segment (228) are spaced from each other in the direction (R1) from the first mirror (202) to the second mirror (206).
(FR)
L’invention concerne un système optique (200) pour une installation de lithographie (100A, 100B), comprenant un premier miroir (202), un deuxième miroir (206) qui définit un chemin optique (204) avec le premier miroir (202) et qui comprend en outre une percée (208), le système optique (200) étant configuré pour que de la lumière de travail (210) tombe à travers la percée (208) sur le premier miroir (202), la lumière de travail (210) étant réfléchie par le premier miroir (202) vers le deuxième miroir (206) et par le deuxième miroir (206) vers un objet cible (212), un diaphragme d’obscuration (222), lequel est disposé sur le chemin optique (204) entre le premier miroir (202) et le deuxième miroir (206), et un diaphragme d’ouverture (224), lequel comprend un premier segment de diaphragme d’ouverture (226) et un deuxième segment de diaphragme d’ouverture (228), le premier segment de diaphragme d’ouverture (226) étant configuré pour ombrer sur au moins une partie de la circonférence de la lumière de travail (210) qui est réfléchie par le premier miroir (202) vers le deuxième miroir (206) et le deuxième segment de diaphragme d’ouverture (228) etant configuré pour ombrer sur au moins une partie de la circonférence de la lumière de travail (210) qui est réfléchie par le deuxième miroir (206) vers l’objet cible (212), le premier segment de diaphragme d’ouverture (226) et le deuxième segment de diaphragme d’ouverture (228) étant espacés l’un de l’autre dans une direction (R1) du premier miroir (202) vers le deuxième miroir (206).
Also published as
Latest bibliographic data on file with the International Bureau