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1. (WO2019048137) METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZED IN A SEMICONDUCTOR MANUFACTURING PROCESS
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Pub. No.: WO/2019/048137 International Application No.: PCT/EP2018/070605
Publication Date: 14.03.2019 International Filing Date: 30.07.2018
IPC:
G03F 7/20 (2006.01) ,H01L 21/66 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66
Testing or measuring during manufacture or treatment
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324 5500 AH Veldhoven, NL
Inventors:
TABERY, Cyrus, Emil; US
CEKLI, Hakki, Ergun; NL
VAN GORP, Simon, Hendrik, Celine; NL
LIN, Chenxi; US
Agent:
PETERS, John; NL
Priority Data:
62/555,00706.09.2017US
Title (EN) METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZED IN A SEMICONDUCTOR MANUFACTURING PROCESS
(FR) PROCÉDÉ DE DÉTERMINATION D'UN PARAMÈTRE DE COMMANDE POUR UN APPAREIL UTILISÉ DANS UN PROCESSUS DE FABRICATION DE SEMI-CONDUCTEURS
Abstract:
(EN) Disclosed herein is a method for determining a control parameter for an apparatus utilised in a semiconductor manufacturing process, the method comprising: obtaining performance data associated with a substrate subject to the semiconductor manufacturing process; obtaining die specification data comprising values of an expected yield of one or more dies on the substrate based on the performance data and/or a specification for the performance data; and determining the control parameter in dependence on the performance data and the die specification data. Advantageously, the efficiency and accuracy of processes are improved by only determining how to perform the processes in dependence on dies within specification.
(FR) L'invention concerne un procédé de détermination d'un paramètre de commande pour un appareil utilisé dans un processus de fabrication de semi-conducteurs, le procédé comprenant les étapes consistant à : obtenir des données de performance associées à un substrat soumis au processus de fabrication de semi-conducteurs ; obtenir des données de spécification de puce comprenant des valeurs d'un rendement attendu d'une ou de plusieurs puces sur le substrat sur la base des données de performance et/ou d'une spécification pour les données de performance ; et déterminer le paramètre de commande en fonction des données de performance et des données de spécification de puce. De manière avantageuse, l'efficacité et la précision des processus sont améliorées en déterminant uniquement la manière d'effectuer les processus en fonction des puces dans la spécification.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)