Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019047856) BASE SUPPORT COMPONENT, FILM FORMING DEVICE AND METHOD
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/047856 International Application No.: PCT/CN2018/104196
Publication Date: 14.03.2019 International Filing Date: 05.09.2018
IPC:
C23C 14/50 (2006.01) ,C23C 14/04 (2006.01) ,C23C 14/24 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
50
Substrate holders
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
鄂尔多斯市源盛光电有限责任公司 ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. [CN/CN]; 中国内蒙古自治区鄂尔多斯市 东胜区鄂尔多斯装备制造基地 Ordos Equipment Manufacturing Base, Dongsheng District Ordos, Inner Mongolia 017020, CN
Inventors:
孙朴 SUN, Pu; CN
吴文泽 WU, Wenze; CN
刘德健 LIU, Dejian; CN
曹飞 CAO, Fei; CN
Agent:
北京市柳沈律师事务所 LIU, SHEN & ASSOCIATES; 中国北京市 海淀区彩和坊路10号1号楼10层 10th Floor, Building 1, 10 Caihefang Road, Haidian District Beijing 100080, CN
Priority Data:
201710800465.907.09.2017CN
Title (EN) BASE SUPPORT COMPONENT, FILM FORMING DEVICE AND METHOD
(FR) ÉLÉMENT DE SUPPORT DE BASE, DISPOSITIF ET PROCÉDÉ DE FORMATION DE FILM
(ZH) 基底支持组件、成膜设备和方法
Abstract:
(EN) A base support component (10), comprising a support plate (1) which is configured to support a base (5) in a film forming process. The support plate (1) has a working surface configured to face the base (5), wherein a plurality of openings (11) are formed in the working surface of the support plate (1) at intervals; a moving block (2) and a driver (3) are disposed in at least some or all of the plurality of openings (11); the driver (3) is configured to drive the moving block (2) to ascend and descend relative to the working surface, so that the top surface of the moving block (2) may at least move between a position flush with the working surface and a position protruding from the working surface. Further disclosed are a film forming device and a film forming method.
(FR) La présente invention concerne un élément de support de base (10), comprenant une plaque de support (1) conçue pour porter une base (5) au cours d'un processus de formation de film. La plaque de support (1) comporte une surface de travail conçue pour faire face à la base (5), une pluralité d'ouvertures (11) étant formées à intervalles dans la surface de travail de la plaque de support (1) ; un bloc mobile (2) et une came (3) sont disposés dans au moins une partie ou dans la totalité de la pluralité d'ouvertures (11) ; la came (3) est conçue pour entraîner le bloc mobile (2) en montée et en descente par rapport à la surface de travail, de sorte que la surface supérieure du bloc mobile (2) peut au moins se déplacer entre une position affleurant la surface de travail et une position faisant saillie depuis la surface de travail. L'invention concerne également un dispositif de formation de film et un procédé de formation de film.
(ZH) 一种基底支持组件(10),包括配置为在成膜工艺中支持基底(5)的支持板(1),支持板(1)具有配置为朝向基底(5)的工作面,其中,支持板(1)的工作面上设置有间隔的多个开口(11),多个开口(11)至少部分或全部中设有活动块(2)和驱动器(3)驱动器(3)配置为驱动活动块(2)相对于工作面升降,以使活动块(2)的顶面至少能在与工作面齐平的位置和凸出于工作面的位置间运动。还公开了一种成膜设备和成膜方法。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)