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1. (WO2019047357) OLED DISPLAY PANEL AND MANUFACTURING PROCESS THEREFOR
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Pub. No.: WO/2019/047357 International Application No.: PCT/CN2017/109534
Publication Date: 14.03.2019 International Filing Date: 06.11.2017
IPC:
H01L 21/77 (2017.01) ,H01L 27/12 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
77
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
02
including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
12
the substrate being other than a semiconductor body, e.g. an insulating body
Applicants:
深圳市华星光电半导体显示技术有限公司 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN/CN]; 中国广东省深圳市 光明新区公明街道塘明大道9-2号 No. 9-2, Tangming Road Gongming Street, Guangming New District Shenzhen, Guangdong 518132, CN
Inventors:
张良芬 ZHANG, Liangfen; CN
Agent:
深圳翼盛智成知识产权事务所(普通合伙) ESSEN PATENT & TRADEMARK AGENCY; 中国广东省深圳市 福田区深南大道6021号喜年中心A座1709-1711 Room 1709-1711, Hailrun Complex Block A No. 6021 Shennan Blvd., Futian District Shenzhen, Guangdong 518040, CN
Priority Data:
201710788449.205.09.2017CN
Title (EN) OLED DISPLAY PANEL AND MANUFACTURING PROCESS THEREFOR
(FR) PANNEAU D'AFFICHAGE À DIODES ÉLECTROLUMINESCENTES ORGANIQUES ET SON PROCÉDÉ DE FABRICATION
(ZH) 一种OLED显示面板及其制程
Abstract:
(EN) An OLED display panel and a manufacturing process therefor. The manufacturing process comprises: sequentially depositing multiple layers of thin films (140) on an auxiliary electrode layer (121), the densities of individual thin films in the multiple layers of thin films (140) being gradually increased from the bottom to the top (S105); using the multiple layers of thin films (140) to form a predetermined pattern where the multiple layers of thin films (140) have an equal width (S106); and dry etching the multiple layers of thin films (140) so that the widths of the individual thin films in the multiple layers of thin films (140) are gradually increased from the bottom to the top (S107), and forming an inverted trapezoidal cathode isolation column (141) (S108). The cathode isolation column (141) has good process stability.
(FR) La présente invention concerne un panneau d'affichage à diodes électroluminescentes organiques et son procédé de fabrication. Le procédé de fabrication consiste à : déposer séquentiellement de multiples couches de films minces (140) sur une couche d'électrode auxiliaire (121), les densités de films minces individuels dans les multiples couches de films minces (140) augmentant progressivement du bas vers le haut (S105); utiliser les multiples couches de films minces (140) pour former un motif prédéterminé où les multiples couches de films minces (140) ont une largeur égale (S106); et graver à sec les multiples couches de films minces (140) de telle sorte que les largeurs des films minces individuels dans les multiples couches de films minces (140) augmentent progressivement du bas vers le haut (S107), et forment une colonne d'isolation de cathode trapézoïdale inversée (141) (S108). La colonne d'isolation de cathode (141) a une bonne stabilité de traitement.
(ZH) 一种OLED显示面板及其制程,制程包括:在辅助电极层(121)上依次沉积多层薄膜(140),多层薄膜(140)中单层薄膜的致密性从下往上逐渐增大(S105);将多层薄膜(140)形成多层薄膜(140)的宽度相等的预设图案(S106);对多层薄膜(140)进行干蚀刻,以使多层薄膜(140)中单层薄膜的宽度从下往上逐渐变大(S107),形成倒梯形的阴极隔离柱(141)(S108)。阴极隔离柱(141)的制程稳定性好。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)