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1. (WO2019046649) METHODS AND APPARATUS FOR COMPENSATING IMAGE DISTORTION AND ILLUMINATION NONUNIFORM ITY IN A WAVEGUIDE
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Pub. No.: WO/2019/046649 International Application No.: PCT/US2018/048960
Publication Date: 07.03.2019 International Filing Date: 30.08.2018
IPC:
G02B 6/00 (2006.01) ,G02B 6/122 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
6
Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
6
Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
10
of the optical waveguide type
12
of the integrated circuit kind
122
Basic optical elements, e.g. light-guiding paths
Applicants:
DIGILENS, INC. [US/US]; 1288 Hammerwood Avenue Sunnyvale, CA 94089, US
Inventors:
WALDERN, Jonathan, David; US
HE, Sihui; US
GRANT, Alastair, John; US
POPOVICH, Milan, Momcilo; GB
Agent:
HOANG, Loi, T.; US
Priority Data:
62/605,83030.08.2017US
Title (EN) METHODS AND APPARATUS FOR COMPENSATING IMAGE DISTORTION AND ILLUMINATION NONUNIFORM ITY IN A WAVEGUIDE
(FR) PROCÉDÉS ET APPAREIL DE COMPENSATION DE DISTORSION D'IMAGE ET DE NON-UNIFORMITÉ D'ÉCLAIRAGE DANS UN GUIDE D'ONDES
Abstract:
(EN) Typical waveguides rely on total internal reflection between the outer surfaces of substrates, which can make them highly susceptible to beam misalignment caused by nonplanarity of the substrates. In the manufacturing of the glass sheets commonly used for substrates, ripples can occur during the stretching and drawing of glass as it emerges from a furnace. Although glass manufacturers try to minimize ripples using predictions from mathematical models, it is difficult to totally eradicate the problem from the glass manufacturing process. Typically, these beam misalignments manifest themselves as image distortions and non-uniformities in the output illumination from the waveguide. Many embodiments of the invention are directed toward optically efficient, low cost solutions to the problem of controlling output image quality in waveguides manufactured using commercially available substrate glass and to the problem of compensating the image distortions and non-uniformity of curved waveguides.
(FR) Les guides d'ondes typiques reposent sur le principe de réflexion interne totale entre les surfaces externes de substrats, ce qui peut les rendre très sensibles au désalignement de faisceaux provoqué par la non-planéité des substrats. Lors de la fabrication des plaques de verre couramment utilisées pour les substrats, des ondulations peuvent se produire pendant l'étirage et le tirage du verre à mesure qu'il sort d'un four. Bien que les fabricants de verre essayent de réduire au minimum les ondulations à l'aide de prédictions à partir de modèles mathématiques, il est difficile d'éradiquer totalement le problème lié au processus de fabrication de verre. Typiquement, ces désalignements de faisceaux se manifestent sous la forme de distorsions d'image et de non-uniformités dans l'éclairage de sortie provenant du guide d'ondes. De nombreux modes de réalisation de l'invention concernent des solutions à faible coût optiquement efficaces pour résoudre le problème de commande de la qualité d'image de sortie dans des guides d'ondes fabriqués à l'aide de verre de substrat disponible dans le commerce et le problème de compensation des distorsions d'image et de la non-uniformité de guides d'ondes incurvés.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)