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1. (WO2019046573) POLYMER-ENCASED NANODISCS WITH IMPROVED BUFFER COMPATIBILITY
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Pub. No.: WO/2019/046573 International Application No.: PCT/US2018/048840
Publication Date: 07.03.2019 International Filing Date: 30.08.2018
IPC:
C08F 222/08 (2006.01) ,C08F 8/32 (2006.01) ,C08F 8/34 (2006.01) ,C08F 8/40 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
222
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
04
Anhydrides, e.g. cyclic anhydrides
06
Maleic anhydride
08
with vinyl aromatic monomers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Chemical modification by after-treatment
30
Introducing nitrogen atoms or nitrogen-containing groups
32
by reaction with amines
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Chemical modification by after-treatment
34
Introducing sulfur atoms or sulfur-containing groups
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8
Chemical modification by after-treatment
40
Introducing phosphorus atoms or phosphorus-containing groups
Applicants:
TEXAS TECH UNIVERSITY SYSTEM [US/US]; Office of Research Commercialization P.O. Box 42007 Lubbock, TX 79409-2007, US
Inventors:
ALTENBERG, Guillermo, A.; US
LIANG, Hongjun; US
Agent:
FLORES, Edwin, S.; US
CHALKER, Daniel, J.; US
CHALKER FLORES, LLP; Daneil J. Chalker 14951 North Dallas Parkways, Suite 400 Dallas, TX 75254, US
Priority Data:
16/117,07330.08.2018US
62/552,60531.08.2017US
62/596,97611.12.2017US
Title (EN) POLYMER-ENCASED NANODISCS WITH IMPROVED BUFFER COMPATIBILITY
(FR) NANODISQUES ENROBÉS DE POLYMÈRE PRÉSENTANT UNE COMPATIBILITÉ AU TAMPON AMÉLIORÉE
Abstract:
(EN) The present invention includes compositions, methods, and methods of making and using a polymer-encased nanodisc comprising: one or more integral membrane proteins in a lipid layer; and a polymer comprising zwitterionic styrene-maleic acid derivative repeating units that carry zero or nearly zero negative charge, and the polymer-encased nanodiscs.
(FR) La présente invention concerne des compositions, des procédés et des procédés de fabrication et d'utilisation d'un nanodisque enrobé de polymère comprenant : une ou plusieurs protéines membranaires intégrales dans une couche lipidique; et un polymère comprenant des motifs de répétition dérivés d'acide maléique/styrène zwitterionique qui transportent aucune ou presque aucune charge négative, et les nanodisques enrobés de polymère.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)