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1. WO2019046327 - PULSED POWER GENERATION USING MAGNETRON RF SOURCE WITH INTERNAL MODULATION

Publication Number WO/2019/046327
Publication Date 07.03.2019
International Application No. PCT/US2018/048384
International Filing Date 28.08.2018
IPC
H05H 7/02 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
7Details of devices of the types covered by groups H05H9/-H05H13/102
02Circuits or systems for supplying or feeding radio-frequency energy
H05H 9/00 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
9Linear accelerators
CPC
H01J 25/50
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
25Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
50Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field
H05H 2007/025
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
7Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
02Circuits or systems for supplying or feeding radio-frequency energy
025Radiofrequency systems
H05H 2007/027
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
7Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
02Circuits or systems for supplying or feeding radio-frequency energy
027Microwave systems
H05H 7/02
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
7Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
02Circuits or systems for supplying or feeding radio-frequency energy
Applicants
  • MUONS, INC. [US]/[US]
Inventors
  • KAZAKEVICH, Grigory M.
Agents
  • PERDOK, Monique M.,
  • ARORA, Suneel, Reg. No. 42,267
  • BEEKMAN, Marvin L.
  • BIANCHI, Timothy E., Reg. No. 39,610
  • BLACK, David W., Reg. No. 42,331
  • MCCRACKIN, Ann M., Reg. No. 42,858
  • SCHEER, Bradley W., Reg. No. 47,059
Priority Data
62/551,06628.08.2017US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PULSED POWER GENERATION USING MAGNETRON RF SOURCE WITH INTERNAL MODULATION
(FR) GÉNÉRATION D'ÉNERGIE PULSÉE AU MOYEN D'UNE SOURCE RF À MAGNÉTRON AVEC MODULATION INTERNE
Abstract
(EN)
A system uses one or more magnetrons to generate pulsed radio-frequency (RF) power, such as for powering an accelerating cavity. The one or more magnetrons each having a self-excitation threshold voltage and configured to operate with internal modulation using a pulsed RF input signal to produce the pulsed RF power when being powered by a direct-current power supply at a voltage level below the self-excitation threshold voltage.
(FR)
La présente invention concerne un système qui utilise un ou plusieurs magnétrons pour générer une énergie à radiofréquence (RF) pulsée, par exemple pour alimenter une cavité d'accélération. Les un ou plusieurs magnétrons ont chacun une tension de seuil d'auto-excitation et sont configurés pour fonctionner avec une modulation interne au moyen d'un signal d'entrée RF pulsé pour produire la puissance RF pulsée lorsqu'ils sont alimentés par une alimentation en courant continu à un niveau de tension inférieur à la tension de seuil d'auto-excitation.
Also published as
JP2020512824
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