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1. (WO2019045519) TARGET FOR PHYSICAL VAPOR DEPOSITION, NANOCOMPOSITE COATING FILM USING SAME, AND PREPARATION METHOD THEREFOR
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Pub. No.: WO/2019/045519 International Application No.: PCT/KR2018/010147
Publication Date: 07.03.2019 International Filing Date: 31.08.2018
IPC:
C23C 14/34 (2006.01) ,C23C 14/06 (2006.01) ,C22C 16/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
16
Alloys based on zirconium
Applicants:
한국생산기술연구원 KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY [KR/KR]; 충청남도 천안시 서북구 입장면 양대기로길 89 89, Yangdaegiro-gil, Ipjang-myeon, Seobuk-gu Cheonan-si Chungcheongnam-do 31056, KR
Inventors:
이한찬 LEE, Han Chan; KR
문경일 MOON, Kyoung Il; KR
방경배 BANG, Gyung Bae; KR
신승용 SHIN, Seung Yong; KR
박현준 PARK, Hyun Jun; KR
김태환 KIM, Tae Hwan; KR
윤혜원 YOON, Hae Won; KR
오세필 OH, Se Pil; KR
정훈 JUNG, Hun; KR
Agent:
이인행 LEE, In Haeng; KR
김남식 KIM, Nam Sik; KR
Priority Data:
10-2017-011096231.08.2017KR
10-2018-010328831.08.2018KR
Title (EN) TARGET FOR PHYSICAL VAPOR DEPOSITION, NANOCOMPOSITE COATING FILM USING SAME, AND PREPARATION METHOD THEREFOR
(FR) CIBLE POUR DÉPÔT PHYSIQUE EN PHASE VAPEUR, FILM DE REVÊTEMENT NANOCOMPOSITE L'UTILISANT, ET PROCÉDÉ DE PRÉPARATION ASSOCIÉ
(KO) 물리증착용 타겟 및 이를 이용한 나노 복합 코팅막 및 그 제조방법
Abstract:
(EN) The present invention provides a target for physical vapor deposition, the target being formed of a Zr-Cu-Si based alloy in order to form a low-friction coating film, wherein the target comprises 82-90 at% of Zr, 4-14 at% of Cu, and 4-8 at% of Si.
(FR) La présente invention concerne une cible pour dépôt physique en phase vapeur, la cible étant constituée d'un alliage à base de Zr-Cu-Si afin de former un film de revêtement à faible frottement, la cible comprenant de 82 à 90 % at de Zr, de 4 à 14 % at de Cu, et de 4 à 8 % at de Si.
(KO) 본 발명은 저마찰 코팅막을 형성하기 위하여 Zr-Cu-Si계 합금으로 이루어진 물리증착 타겟으로서, Zr이 82원자% 내지 90원자%; Cu가 4원자% 내지 14원자%; 및 Si이 4원자% 내지 8원자%;로 이루어진, 물리증착 타겟을 제공한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)