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1. (WO2019045377) MULTIFUNCTIONAL PHOTO-ACID GENERATOR AND PHOTORESIST COMPOSITION COMPRISING SAME FOR THICK FILM
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Pub. No.: WO/2019/045377 International Application No.: PCT/KR2018/009822
Publication Date: 07.03.2019 International Filing Date: 24.08.2018
IPC:
G03F 7/004 (2006.01) ,G03F 7/039 (2006.01) ,C07D 221/14 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
221
Heterocyclic compounds containing six-membered rings having one nitrogen atom as the only ring hetero atom, not provided for by groups C07D211/-C07D219/187
02
condensed with carbocyclic rings or ring systems
04
Ortho- or peri-condensed ring systems
06
Ring systems of three rings
14
Aza-phenalenes, e.g. 1,8-naphthalimide
Applicants:
주식회사 엘지화학 LG CHEM, LTD. [KR/KR]; 서울시 영등포구 여의대로 128 128, Yeoui-daero, Yeongdeungpo-Gu, Seoul 07336, KR
Inventors:
임민영 LIM, Min Young; KR
이태섭 LEE, Tae Seob; KR
박현민 PARK, Hyun Min; KR
Agent:
유미특허법인 YOU ME PATENT AND LAW FIRM; 서울시 강남구 테헤란로 115 115 Teheran-ro Gangnam-gu Seoul 06134, KR
Priority Data:
10-2017-011269004.09.2017KR
Title (EN) MULTIFUNCTIONAL PHOTO-ACID GENERATOR AND PHOTORESIST COMPOSITION COMPRISING SAME FOR THICK FILM
(FR) GÉNÉRATEUR PHOTOACIDE MULTIFONCTIONNEL ET COMPOSITION DE RÉSINE PHOTOSENSIBLE LE COMPRENANT POUR USAGE AVEC FILM ÉPAIS
(KO) 다기능성 광산발생제 및 이를 포함하는 후막용 포토레지스트 조성물
Abstract:
(EN) The present invention relates to a photo-acid generator and a chemical amplification type photoresist composition comprising the same for a thick film, wherein the photo-acid generator has, besides effects as a photo-acid generator, remarkable solubility and sensitivity as well as an excellent anti-corrosive effect. Therefore, the chemical amplification type photoresist composition comprising the photo-acid generator for a thick film has an effect of reducing scum and/or footing on an exposure unit after development.
(FR) La présente invention concerne un générateur photoacide et une composition de résine photosensible de type à amplification chimique le comprenant un film épais. Outre les effets de générateur photo-acide, le générateur photoacide possède une solubilité et une sensibilité remarquables ainsi qu'un excellent effet anticorrosion. Par conséquent, la composition de résine photosensible de type à amplification chimique comprenant le générateur photoacide pour un film épais a pour effet de réduire la crasse et/ou les résidus sur une unité d'exposition après le développement.
(KO) 본 발명은 광산발생제 및 이를 포함하는 후막용 화학증폭형 포토레지스트 조성물에 관한 것으로서, 상기 광산발생제는 광산발생제로서의 효과 이외에, 용해도 및 감도가 우수하며, 뛰어난 부식방지 효과 또한 존재한다. 따라서, 상기 광산발생제를 포함하는 후막용 막용 화학증폭형 포토레지스트 조성물은 현상 후 노광부에 스컴 (scum) 및 /또는 풋팅 (footing)이 줄어드는 효과가 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)