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1. (WO2019045235) HARD COATING HAVING EXCELLENT ABRASION RESISTANCE AND TOUGHNESS
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Pub. No.: WO/2019/045235 International Application No.: PCT/KR2018/006778
Publication Date: 07.03.2019 International Filing Date: 15.06.2018
IPC:
C23C 14/06 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
Applicants:
한국야금 주식회사 KORLOY INC. [KR/KR]; 서울시 금천구 남부순환로 1350 1350, Nambusunhwan-ro Geumcheon-gu Seoul 08536, KR
Inventors:
박제훈 PAKR, Je-hun; KR
안승수 AHN, Seung-su; KR
박성모 PARK, Seong-mo; KR
권진한 GWON, Jin-han; KR
김경일 KIM, Kyoung-il; KR
김범식 KIM, Beom-sik; KR
안선용 AHN, Sun-yong; KR
Agent:
특허법인 아이엠 IAM PATENT FIRM; 서울시 강남구 봉은사로224, 403호 403, 224, Bongeunsa-ro, Gangnam-gu, Seoul 06135, KR
Priority Data:
10-2017-011161101.09.2017KR
Title (EN) HARD COATING HAVING EXCELLENT ABRASION RESISTANCE AND TOUGHNESS
(FR) REVÊTEMENT DUR AYANT UNE EXCELLENTE RÉSISTANCE À L'ABRASION ET UNE EXCELLENTE TÉNACITÉ
(KO) 내마모성과 인성이 우수한 경질피막
Abstract:
(EN) The purpose of the present invention is to provide a hard coating having improved abrasion resistance and toughness, formed by a PVD method, and comprising a first hard layer and a second layer, wherein: the first hard layer has a thickness of 0.1-3.0 μm, is made of Til-aAlaN (0.3≤a≤0.7) and has a single phase structure; the second hard layer has a thickness of 0.5-10 μm and is made of Til-a-bAlaMebN (0.3≤a≤0.7, 0≤b≤0.05; Me is one or more selected from V, Zr, Si, Nb, Cr, Mo, Hf, Ta and W); the ratio ([200]/[111]) of the intensity of [200] peak to the intensity of [111] peak is 1.5 or more in XRD phase analysis and preferred growth occurs in the direction [200]; the [200] peak is located at 42.7-44.6°and is simultaneously composed of three phases; the [111] peak is located at 37.0-38.5° and is simultaneously composed of three phases; and, when a peak having the highest intensity among peaks relating to the three phases is a main peak and the remaining peaks are side peaks, the ratio (main peak/side peaks) of the intensity of the main peak to the intensity of the side peaks, of the [200] plane, is 2 or more and the ratio (main peak/side peaks) of the intensity of the main peak to the intensity of the side peaks, of the [111] plane, is 2 or more.
(FR) Le but de la présente invention est de fournir un revêtement dur ayant une résistance à l'abrasion et une ténacité améliorées, formé par un procédé de dépôt physique en phase vapeur (PVD), et comprenant une première couche dure et une seconde couche : la première couche dure a une épaisseur de 0,1 à 3,0 µm, est faite de Til-aAlaN (0,3 ≤ a ≤ 0,7) et a une structure à phase unique ; la seconde couche dure a une épaisseur de 0,5 à 10 µm et est constituée de Til-a-bAlaMebN (0,3 ≤ a ≤0,7, 0 ≤ b ≤ 0,05) ; Me est un ou plusieurs éléments choisis parmi V, Zr, Si, Nb, Cr, Mo, Hf, Ta et W) ; le rapport ([200]/[111]) de l'intensité du pic [200] à l'intensité du pic [111] est supérieur ou égal à 1,5 dans l'analyse de phase XRD et la croissance préférée se produit dans la direction [200] ; le pic [200] est situé à 42,7-44,6° et est simultanément composé de trois phases ; le pic [111] est situé à 37,0-38,5° et est simultanément composé de trois phases ; et, lorsqu'un pic ayant l'intensité la plus élevée parmi les pics concernant les trois phases est un pic principal et les pics restants sont des pics secondaires, le rapport (pic principal/pics secondaires) de l'intensité du pic principal à l'intensité des pics secondaires, du plan [200], est de 2 ou plus et le rapport (pic principal/pics secondaires) de l'intensité du pic principal à l'intensité des pics secondaires, du plan [111], est de 2 ou plus.
(KO) 본 발명은 내마모성과 인성을 향상시킨 경질 피막을 제공하기 위한 것으로, PVD법으로 형성되며, 제1 경질층과 제2 경질층을 포함하고, 상기 제1 경질층은 두께가 0.1~3.0㎛이고, Til-aAlaN (0.3≤a≤0.7)으로 이루어지며, 단상 구조를 가지고, 상기 제2 경질층은 두께가 0.5~10㎛이고, Til-a-bAlaMebN (0.3≤a≤0.7, 0≤b≤0.05, 상기 Me는 V, Zr, Si, Nb, Cr, Mo, Hf, Ta, W 중에서 선택된 1종 이상)으로 이루어지고, XRD 상분석법에 의할 때, [111] 피크의 강도에 대한 [200] 피크의 강도의 비([200]/[111])가 1.5 이상으로 [200] 방향으로 우선성장하고, 상기 [200] 피크는 42.7°~ 44.6°에 위치함과 동시에 3개의 상으로 이루어지고, 상기 [111] 피크는 37.0°~ 38.5°에 위치함과 동시에 3개의 상으로 이루어지며, 상기 3개의 상에 관한 피크 중에서 강도가 가장 큰 피크를 주 피크라고 하고 나머지를 보조 피크라고 할 때, [200]면의 보조 피크의 강도에 대한 주 피크의 강도의 비(주 피크/보조 피크)는 2 이상이고, [111]면의 보조 피크의 강도에 대한 주 피크의 강도의 비(주 피크/보조 피크)는 2 이상인 것을 특징으로 한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)