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1. (WO2019045063) FLUOROSULFONYL GROUP-CONTAINING COMPOUND, FLUOROSULFONYL GROUP-CONTAINING MONOMER, AND PRODUCTION METHODS FOR SAME
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Pub. No.: WO/2019/045063 International Application No.: PCT/JP2018/032433
Publication Date: 07.03.2019 International Filing Date: 31.08.2018
IPC:
C07C 309/82 (2006.01) ,C07C 303/22 (2006.01) ,C07C 309/80 (2006.01) ,C08F 20/22 (2006.01) ,C25B 13/08 (2006.01) ,H01B 1/06 (2006.01) ,H01B 1/12 (2006.01) ,H01M 4/86 (2006.01) ,H01M 8/10 (2016.01) ,H01M 8/1023 (2016.01) ,H01M 8/18 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
309
Sulfonic acids; Halides, esters, or anhydrides thereof
78
Halides of sulfonic acids
79
having halosulfonyl groups bound to acyclic carbon atoms
82
of a carbon skeleton substituted by singly-bound oxygen atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
303
Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
02
of sulfonic acids or halides thereof
22
from sulfonic acids by reactions not involving the formation of sulfo or halosulfonyl groups
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
309
Sulfonic acids; Halides, esters, or anhydrides thereof
78
Halides of sulfonic acids
79
having halosulfonyl groups bound to acyclic carbon atoms
80
of a saturated carbon skeleton
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
22
Esters containing halogen
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
B
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON- METALS; APPARATUS THEREFOR
13
Diaphragms; Spacing elements
04
characterised by the material
08
based on organic materials
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
1
Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
06
mainly consisting of other non-metallic substances
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
1
Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
06
mainly consisting of other non-metallic substances
12
organic substances
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
M
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
4
Electrodes
86
Inert electrodes with catalytic activity, e.g. for fuel cells
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
M
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
8
Fuel cells; Manufacture thereof
10
Fuel cells with solid electrolytes
[IPC code unknown for H01M 8/1023]
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
M
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
8
Fuel cells; Manufacture thereof
18
Regenerative fuel cells
Applicants:
AGC株式会社 AGC INC. [JP/JP]; 東京都千代田区丸の内一丁目5番1号 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405, JP
Inventors:
平居 丈嗣 HIRAI Takeshi; JP
上牟田 大輔 JOMUTA Daisuke; JP
民辻 慎哉 TAMITSUJI Chikaya; JP
Agent:
泉名 謙治 SENMYO Kenji; JP
小川 利春 OGAWA Toshiharu; JP
金 鎭文 KIM Jin-Moon; JP
比企野 健 HIKINO Ken; JP
横井 大一郎 YOKOI Daiichiro; JP
Priority Data:
2017-16865901.09.2017JP
2018-09175610.05.2018JP
2018-09175710.05.2018JP
Title (EN) FLUOROSULFONYL GROUP-CONTAINING COMPOUND, FLUOROSULFONYL GROUP-CONTAINING MONOMER, AND PRODUCTION METHODS FOR SAME
(FR) COMPOSÉ CONTENANT UN GROUPE FLUOROSULFONYLE, MONOMÈRE CONTENANT UN GROUPE FLUOROSULFONYLE, ET PROCÉDÉS DE PRODUCTION ASSOCIÉS
(JA) フルオロスルホニル基含有化合物、フルオロスルホニル基含有モノマー及びそれらの製造方法
Abstract:
(EN) The present invention relates to: a fluorosulfonyl group-containing compound production method by which a compound represented by formula 5 is obtained using a compound represented by formula 1 as the starting material; and a fluorosulfonyl group-containing monomer production method which uses a fluorosulfonyl group-containing compound. R1 and R2 are C1-C3 alkylene groups, and RF1 and RF2 are C1-C3 perfluoroalkylene groups.
(FR) La présente invention concerne : un procédé de production de composé contenant un groupe fluorosulfonyle par lequel un composé représenté par la formule 5 est obtenu à l'aide d'un composé représenté par la formule 1 en tant que matériau de départ; et un procédé de production de monomère contenant un groupe fluorosulfonyle qui utilise un composé contenant un groupe fluorosulfonyle. R1 et R2 représentent des groupes alkylène en C1-C3, et RF1 et RF2 représentent des groupes perfluoroalkylène en C1-C3.
(JA) 下式1で表される化合物を出発原料として下式5で表される化合物を得るフルオロスルホニル基含有化合物の製造方法、及びフルオロスルホニル基含有化合物を用いたフルオロスルホニル基含有モノマーの製造方法に関する。 ただし、R及びRは、炭素数1~3のアルキレン基であり、RF1及びRF2は、炭素数1~3のペルフルオロアルキレン基である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)