Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019044914) DRUG SOLUTION PURIFICATION METHOD AND DRUG SOLUTION
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/044914 International Application No.: PCT/JP2018/031979
Publication Date: 07.03.2019 International Filing Date: 29.08.2018
IPC:
C11D 7/50 (2006.01) ,B01D 61/14 (2006.01) ,C07B 63/00 (2006.01) ,C07B 63/04 (2006.01) ,C07C 7/00 (2006.01) ,C07C 7/20 (2006.01) ,C07C 9/14 (2006.01) ,C07C 29/74 (2006.01) ,C07C 29/94 (2006.01) ,C07C 31/10 (2006.01) ,C07C 41/34 (2006.01) ,C07C 41/46 (2006.01) ,C07C 43/04 (2006.01) ,C07C 43/13 (2006.01) ,C07C 45/78 (2006.01) ,C07C 45/86 (2006.01) ,C07C 49/04 (2006.01) ,C07C 49/395 (2006.01) ,C07C 49/403 (2006.01) ,C07C 67/48 (2006.01) ,C07C 67/62 (2006.01) ,C07C 69/14 (2006.01) ,C07C 69/68 (2006.01) ,C07C 69/708 (2006.01) ,C07D 307/33 (2006.01) ,G03F 7/004 (2006.01) ,H01L 21/304 (2006.01)
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
7
Compositions of detergents based essentially on non-surface-active compounds
50
Solvents
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
61
Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
14
Ultrafiltration; Microfiltration
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
B
GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
63
Purification; Separation specially adapted for the purpose of recovering organic compounds; Stabilisation; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
B
GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
63
Purification; Separation specially adapted for the purpose of recovering organic compounds; Stabilisation; Use of additives
04
Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
7
Purification, separation or stabilisation of hydrocarbons; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
7
Purification, separation or stabilisation of hydrocarbons; Use of additives
20
Use of additives, e.g. for stabilisation
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
9
Acyclic saturated hydrocarbons
14
with five to fifteen carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
29
Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
74
Separation; Purification; Stabilisation; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
29
Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
74
Separation; Purification; Stabilisation; Use of additives
94
Use of additives, e.g. for stabilisation
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
31
Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
02
Monohydroxylic acyclic alcohols
10
containing three carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
41
Preparation of ethers; Preparation of compounds having groups, groups or groups
01
Preparation of ethers
34
Separation; Purification; Stabilisation; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
41
Preparation of ethers; Preparation of compounds having groups, groups or groups
01
Preparation of ethers
34
Separation; Purification; Stabilisation; Use of additives
46
Use of additives, e.g. for stabilisation
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
43
Ethers; Compounds having groups, groups or groups
02
Ethers
03
having all ether-oxygen atoms bound to acyclic carbon atoms
04
Saturated ethers
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
43
Ethers; Compounds having groups, groups or groups
02
Ethers
03
having all ether-oxygen atoms bound to acyclic carbon atoms
04
Saturated ethers
13
containing hydroxy or O-metal groups
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
45
Preparation of compounds having CO groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
78
Separation; Purification; Stabilisation; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
45
Preparation of compounds having CO groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
78
Separation; Purification; Stabilisation; Use of additives
86
Use of additives, e.g. for stabilisation
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
49
Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
04
Saturated compounds containing keto groups bound to acyclic carbon atoms
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
49
Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
385
Saturated compounds containing a keto group being part of a ring
395
of a five-membered ring
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
49
Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
385
Saturated compounds containing a keto group being part of a ring
403
of a six-membered ring
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
67
Preparation of carboxylic acid esters
48
Separation; Purification; Stabilisation; Use of additives
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
67
Preparation of carboxylic acid esters
48
Separation; Purification; Stabilisation; Use of additives
62
Use of additives, e.g. for stabilisation
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
69
Esters of carboxylic acids; Esters of carbonic or haloformic acids
02
Esters of acyclic saturated monocarboxylic acids having the carboxyl group bound to an acyclic carbon atom or to hydrogen
12
Acetic acid esters
14
of monohydroxylic compounds
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
69
Esters of carboxylic acids; Esters of carbonic or haloformic acids
66
Esters of carboxylic acids having esterified carboxyl groups bound to acyclic carbon atoms and having any of the groups OH, O-metal, -CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
67
of saturated acids
675
of saturated hydroxy-carboxylic acids
68
Lactic acid esters
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
69
Esters of carboxylic acids; Esters of carbonic or haloformic acids
66
Esters of carboxylic acids having esterified carboxyl groups bound to acyclic carbon atoms and having any of the groups OH, O-metal, -CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
67
of saturated acids
708
Ethers
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
307
Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
02
not condensed with other rings
26
having one double bond between ring members or between a ring member and a non-ring member
30
with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
32
Oxygen atoms
33
in position 2, the oxygen atom being in its keto or unsubstituted enol form
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
上村 哲也 KAMIMURA Tetsuya; JP
吉留 正洋 YOSHIDOME Masahiro; JP
河田 幸寿 KAWADA Yukihisa; JP
Agent:
渡辺 望稔 WATANABE Mochitoshi; JP
伊東 秀明 ITOH Hideaki; JP
三橋 史生 MITSUHASHI Fumio; JP
Priority Data:
2017-16731931.08.2017JP
Title (EN) DRUG SOLUTION PURIFICATION METHOD AND DRUG SOLUTION
(FR) PROCÉDÉ DE PURIFICATION DE SOLUTION MÉDICAMENTEUSE ET SOLUTION MÉDICAMENTEUSE
(JA) 薬液の精製方法、及び、薬液
Abstract:
(EN) The present invention addresses the problem of providing a drug solution purification method with which it is possible to obtain a drug solution exhibiting excellent impairment suppression performance. The present invention also addresses the problem of providing a drug solution. The drug solution purification method according to the present invention is for obtaining a drug solution through filtration of a to-be-purified material containing an organic solvent, wherein the contained amount of a stabilizing agent in the to-be-purified material is not less than 0.1 ppm by mass but less than 100 ppm by mass with respect to the total mass of the to-be-purified material.
(FR) La présente invention aborde le problème consistant à fournir un procédé de purification de solution médicamenteuse grâce auquel il est possible d'obtenir une solution médicamenteuse présentant une excellente performance de suppression d'altération. La présente invention aborde également le problème consistant à fournir une solution médicamenteuse. Le procédé de purification de solution médicamenteuse selon la présente invention est destiné à obtenir une solution médicamenteuse par filtration d'un matériau à purifier contenant un solvant organique, la quantité d'agent stabilisant contenue dans le matériau à purifier étant non inférieure à 0,1 ppm en masse mais inférieure à 100 ppm en masse par rapport à la masse totale du matériau à purifier.
(JA) 本発明は、優れた欠陥抑制性能を有する薬液が得られる、薬液の精製方法の提供を課題とする。また、薬液の提供も課題とする。本発明の薬液の精製方法は、有機溶剤を含有する被精製物を精製して薬液を得る、薬液の精製方法であって、被精製物中における安定化剤の含有量が、被精製物の全質量に対して0.1質量ppm以上、100質量ppm未満である。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)