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1. (WO2019044896) TRANSPARENT CONDUCTOR AND ORGANIC DEVICE
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2019/044896 International Application No.: PCT/JP2018/031925
Publication Date: 07.03.2019 International Filing Date: 29.08.2018
IPC:
H01B 5/14 (2006.01) ,B32B 9/00 (2006.01) ,B32B 15/04 (2006.01) ,C23C 14/06 (2006.01) ,C23C 14/08 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/28 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
5
Non-insulated conductors or conductive bodies characterised by their form
14
comprising conductive layers or films on insulating-supports
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
15
Layered products essentially comprising metal
04
comprising metal as the main or only constituent of a layer, next to another layer of a specific substance
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
12
Light sources with substantially two-dimensional radiating surfaces
26
characterised by the composition or arrangement of the conductive material used as an electrode
28
of translucent electrodes
Applicants:
TDK株式会社 TDK CORPORATION [JP/JP]; 東京都中央区日本橋二丁目5番1号 2-5-1, Nihonbashi, Chuo-ku, Tokyo 1036128, JP
Inventors:
新開 浩 SHINGAI Hiroshi; JP
西沢 明憲 NISHIZAWA Akinori; JP
原田 ▲祥▼平 HARADA Shouhei; JP
Agent:
長谷川 芳樹 HASEGAWA Yoshiki; JP
黒木 義樹 KUROKI Yoshiki; JP
三上 敬史 MIKAMI Takafumi; JP
Priority Data:
2017-16461329.08.2017JP
2017-16461529.08.2017JP
Title (EN) TRANSPARENT CONDUCTOR AND ORGANIC DEVICE
(FR) CONDUCTEUR TRANSPARENT ET DISPOSITIF ORGANIQUE
(JA) 透明導電体及び有機デバイス
Abstract:
(EN) Provided is a transparent conductor 10 comprising a transparent substrate 11, a first metal oxide layer 12, a metal layer 18 including a silver alloy, a third metal oxide layer 14, and a second metal oxide layer 16 in this order. The first metal oxide layer 12 is constituted by a metal oxide other than ITO, the second metal oxide layer 16 includes ITO, and the work function of a surface 16a of the second metal oxide layer 16 on the opposite side to the metal layer 18 side is 4.5 eV or higher.
(FR) L'invention concerne un conducteur transparent 10 comprenant un substrat transparent 11, une première couche d'oxyde métallique 12, une couche métallique 18 comprenant un alliage d'argent, une troisième couche d'oxyde métallique 14 et une seconde couche d'oxyde métallique 16 dans cet ordre. La première couche d'oxyde métallique 12 est constituée d'un oxyde métallique autre que l'ITO, la seconde couche d'oxyde métallique 16 comprend de l'ITO, et la fonction de travail d'une surface 16a de la seconde couche d'oxyde métallique 16 sur le côté opposé au côté de la couche métallique 18 est supérieure ou égale à 4,5 eV.
(JA) 透明導電体10は、透明基材11と、第1の金属酸化物層12と、銀合金を含む金属層18と、第3の金属酸化物層14と、第2の金属酸化物層16と、をこの順で備える。第1の金属酸化物層12は、ITOとは異なる金属酸化物で構成され、第2の金属酸化物層16は、ITOを含有し、第2の金属酸化物層16の金属層18側とは反対側の表面16aの仕事関数が4.5eV以上である。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)