Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019044702) LITHOGRAPHIC PRINTNG PLATE PRECURSOR
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/044702 International Application No.: PCT/JP2018/031362
Publication Date: 07.03.2019 International Filing Date: 24.08.2018
IPC:
B41N 3/03 (2006.01) ,B41N 1/08 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/023 (2006.01) ,G03F 7/09 (2006.01) ,G03F 7/095 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
3
Preparing for use or conserving printing surfaces
03
Chemical or electrical pretreatment
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
04
metallic
08
for lithographic printing
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
022
Quinonediazides
023
Macromolecular quinonediazides; Macromolecular additives, e.g. binders
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
095
having more than one photosensitive layer
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
佐藤 尚志 SATO Takashi; JP
松浦 睦 MATSUURA Atsushi; JP
Agent:
特許業務法人航栄特許事務所 KOH-EI PATENT FIRM, P.C.; 東京都港区西新橋一丁目7番13号 虎ノ門イーストビルディング9階 Toranomon East Bldg. 9F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003, JP
Priority Data:
2017-16785631.08.2017JP
Title (EN) LITHOGRAPHIC PRINTNG PLATE PRECURSOR
(FR) PRÉCURSEUR DE PLAQUE D'IMPRESSION LITHOGRAPHIQUE
(JA) 平版印刷版原版
Abstract:
(EN) To provide a lithographic printing plate precursor which has an aluminum support having an anodized film and a positive image recording layer. The anodized film has a thickness ranging from 200 nm to 2,000 nm. The anodized film has micropores each extending in the depth direction from the positive image recording layer side surface. Each micropore has a large diameter pore part (i) extending from the anodized film surface to a location exceeding 60 nm in depth and a small diameter pore part (ii) communicating with the bottom of the large diameter pore part and extending further in the depth direction from the communication position. The average diameter of the small diameter pore part (ii) at the communication position is smaller than the average diameter of the large diameter pore part (i) on the anodized film surface.
(FR) L'invention a pour objectif de fournir un précurseur de plaque d'impression lithographique qui a un support en aluminium ayant un film anodisé et une couche d'enregistrement d'image positive. Le film anodisé a une épaisseur comprise entre 200 nm et 2 000 nm. Le film anodisé a des micropores qui s'étendent chacun dans la direction de la profondeur à partir de la surface côté couche d'enregistrement d'image positive. Chaque micropore a une partie pore de grand diamètre (i) s'étendant à partir de la surface de film anodisé jusqu'à un emplacement dépassant 60 nm en profondeur et une partie pore de petit diamètre (ii) communiquant avec le fond de la partie pore de grand diamètre et s'étendant plus loin dans la direction de profondeur à partir de la position de communication. Le diamètre moyen de la partie pore de petit diamètre (ii) au niveau de la position de communication est inférieur au diamètre moyen de la partie pore de grand diamètre (i) sur la surface de film anodisé.
(JA) 陽極酸化皮膜を有するアルミニウム支持体と、ポジ型画像記録層とを有する平版印刷版原版であって、上記陽極酸化皮膜の厚さは、200nm~2,000nmであり、上記陽極酸化皮膜は、上記ポジ型画像記録層側の表面から深さ方向にのびるマイクロポアを有し、上記マイクロポアが、上記陽極酸化皮膜表面から深さ60nmを超える位置までのびる大径孔部(i)と、上記大径孔部の底部と連通し、連通位置からさらに深さ方向にのびる小径孔部(ii)とを有し、上記連通位置における上記小径孔部(ii)の平均径が、上記陽極酸化皮膜表面における上記大径孔部(i)の平均径よりも小さい平版印刷版原版を提供する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)