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1. (WO2019044668) ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN FILM, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD
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Pub. No.: WO/2019/044668 International Application No.: PCT/JP2018/031231
Publication Date: 07.03.2019 International Filing Date: 23.08.2018
IPC:
G03F 7/038 (2006.01) ,C08F 220/12 (2006.01) ,G03F 7/039 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
12
of monohydric alcohols or phenols
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
高桑 英希 TAKAKUWA Hideki; JP
吉野 文博 YOSHINO Fumihiro; JP
Agent:
特許業務法人航栄特許事務所 KOH-EI PATENT FIRM, P.C.; 東京都港区西新橋一丁目7番13号 虎ノ門イーストビルディング9階 Toranomon East Bldg. 9F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003, JP
Priority Data:
2017-16785131.08.2017JP
Title (EN) ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN FILM, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD
(FR) COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU À UN RAYONNEMENT, FILM DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU À UN RAYONNEMENT, PROCÉDÉ DE FORMATION DE MOTIF, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF ÉLECTRONIQUE
(JA) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性樹脂膜、パターン形成方法、及び電子デバイスの製造方法
Abstract:
(EN) Provided is an active light-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit expressed by a specific general formula, a repeating unit expressed by a specific general formula, and a repeating unit expressed by a specific general formula, the content amount of the repeating unit expressed by general formula (1) being a range of 25-50 mol% with respect to all of the repeating units in the resin (A); (B) a compound that produces an acid through irradiation with an active light ray or radiation; and (C) a solvent. Also provided are: an active light-sensitive or radiation-sensitive resin film that uses the active light-sensitive or radiation-sensitive resin composition; a pattern-forming method; and a method for producing an electronic device.
(FR) L'invention fournit une composition de résine sensible aux rayons actiniques ou à un rayonnement qui comprend : (A) une résine qui comprend à son tour une unité de répétition représentée par une formule générale spécifique, une unité de répétition représentée par une formule générale spécifique et une unité de répétition représentée par une formule générale spécifique, la teneur en unité de répétition représentée par la formule générale (1) étant comprise dans une plage de 25 à 50% en moles pour l'ensemble des unités de répétition contenues dans la résine (A) ; (B) un composé générant un acide par irradiation au moyen de rayons actiniques ou d'un rayonnement ; et (C) un solvant. L'invention fournit en outre un film de résine sensible aux rayons actiniques ou à un rayonnement, un procédé de formation de motif et un procédé de fabrication de dispositif électronique qui mettent en œuvre cette composition de résine sensible aux rayons actiniques ou à un rayonnement.
(JA) (A)特定の一般式で表される繰り返し単位、特定の一般式で表される繰り返し単位、及び特定の一般式で表される繰り返し単位を含有し、上記一般式(1)で表される繰り返し単位の含有量が、樹脂(A)中の全繰り返し単位に対して25~50モル%の範囲である樹脂、(B)活性光線又は放射線の照射により酸を発生する化合物、及び(C)溶剤を含有する感活性光線性又は感放射線性樹脂組成物、これを用いた感活性光線性又は感放射線性樹脂膜、パターン形成方法、及び電子デバイスの製造方法を提供する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)