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1. (WO2019044483) LITHOGRAPHIC PRINTING ORIGINAL PLATE AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE
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Pub. No.: WO/2019/044483 International Application No.: PCT/JP2018/030245
Publication Date: 07.03.2019 International Filing Date: 13.08.2018
IPC:
B41N 1/14 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/027 (2006.01) ,G03F 7/11 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
12
non-metallic other than stone
14
Lithographic printing foils
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
工藤 康太郎 KUDO, Kotaro; JP
森田 佳樹 MORITA, Yoshiki; JP
舩津 景勝 FUNATSU, Keisho; JP
村上 平 MURAKAMI, Taira; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2017-16743331.08.2017JP
Title (EN) LITHOGRAPHIC PRINTING ORIGINAL PLATE AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE
(FR) PLAQUE ORIGINALE D'IMPRESSION LITHOGRAPHIQUE ET PROCÉDÉ DE PRODUCTION D'UNE PLAQUE D'IMPRESSION LITHOGRAPHIQUE
(JA) 平版印刷版原版、及び、平版印刷版の作製方法
Abstract:
(EN) Provided are a lithographic printing original plate having an image recording layer provided on a support, and a method for producing a lithographic printing plate using the lithographic printing original plate, wherein the lithographic printing original plate has convex portions formed discontinuously on the outermost layer surface on a side of the original plate in which the image recording layer is provided, and the convex portions have a melting point of 70°C to 150°C. The method for producing the lithographic printing plate preferably includes: a step for forming an exposed portion and an unexposed portion by imagewise exposing the lithographic printing original plate; and a step for removing a non-image portion and the unexposed portion by supplying at least one from among printing ink and dampening water.
(FR) L'invention concerne une plaque originale d'impression lithographique ayant une couche d'enregistrement d'image disposée sur un support, et un procédé de production d'une plaque d'impression lithographique à l'aide de la plaque originale d'impression lithographique, la plaque originale d'impression lithographique ayant des parties convexes formées de manière discontinue sur la surface de couche la plus à l'extérieur sur un côté de la plaque originale dans laquelle est fournie la couche d'enregistrement d'image, et les parties convexes ont un point de fusion de 70 °C à 150 °C. Le procédé de production de la plaque d'impression lithographique comprend de préférence : une étape consistant à former une partie exposée et une partie non exposée par exposition en image de la plaque originale d'impression lithographique; et une étape consistant à retirer une partie de non-image et la partie non exposée en fournissant au moins l'une parmi l'encre d'impression et l'eau de mouillage.
(JA) 支持体上に画像記録層を設けた平版印刷版原版であって、上記画像記録層が設けられた側の最外層の表面に非連続状に形成された凸部を有し、上記凸部の融点が、70℃~150℃である平版印刷版原版、及び、上記平版印刷版原版を用いた平版印刷版の作製方法。上記平版印刷版の作製方法として、好ましくは、平版印刷版原版を画像様に露光し、露光部と未露光部とを形成する工程、及び、印刷インキ及び湿し水の少なくとも一方を供給して非画像部上記未露光部を除去する工程を含む。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)