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1. (WO2019044479) FLUORINE-CONTAINING ETHER COMPOUND, FLUORINE-CONTAINING ETHER COMPOSITION, COATING SOLUTION, ARTICLE AND METHOD FOR PRODUCING SAME
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Pub. No.: WO/2019/044479 International Application No.: PCT/JP2018/030223
Publication Date: 07.03.2019 International Filing Date: 13.08.2018
IPC:
C08G 65/336 (2006.01) ,C09D 171/02 (2006.01) ,C09K 3/18 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
65
Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
02
from cyclic ethers by opening of the heterocyclic ring
32
Polymers modified by chemical after-treatment
329
with organic compounds
336
containing silicon
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
171
Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
02
Polyalkylene oxides
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
18
for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Applicants:
AGC株式会社 AGC INC. [JP/JP]; 東京都千代田区丸の内一丁目5番1号 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008405, JP
Inventors:
宇野 誠人 UNO Makoto; JP
山本 弘賢 YAMAMOTO Hiromasa; JP
星野 泰輝 HOSHINO Taiki; JP
松浦 啓吾 MATSUURA Keigo; JP
安樂 英一郎 ANRAKU Eiichiro; JP
Agent:
泉名 謙治 SENMYO Kenji; JP
小川 利春 OGAWA Toshiharu; JP
金 鎭文 KIM Jin-Moon; JP
比企野 健 HIKINO Ken; JP
横井 大一郎 YOKOI Daiichiro; JP
Priority Data:
2017-16799931.08.2017JP
Title (EN) FLUORINE-CONTAINING ETHER COMPOUND, FLUORINE-CONTAINING ETHER COMPOSITION, COATING SOLUTION, ARTICLE AND METHOD FOR PRODUCING SAME
(FR) COMPOSÉ ÉTHER CONTENANT DU FLUOR, COMPOSITION D'ÉTHER CONTENANT DU FLUOR, SOLUTION DE REVÊTEMENT, ARTICLE ET PROCÉDÉ DE PRODUCTION ASSOCIÉ
(JA) 含フッ素エーテル化合物、含フッ素エーテル組成物、コーティング液、物品およびその製造方法
Abstract:
(EN) Provided are a fluorine-containing ether compound, a fluorine-containing ether composition, and a coating solution capable of forming a surface layer having excellent initial water and oil repellency, fingerprint removability, abrasion resistance, light resistance, and chemical resistance, as well as an article having the surface layer and a method for producing the same. A fluorine-containing ether compound represented by A-O-(Rf1O)m-Q1(R1)b. Where, A is a C1-20 perfluoroalkyl group, Rf1 is a perfluoroalkylene group, m is an integer of 2-500, (Rf1O)m may comprise Rf1O having two different numbers of carbon atoms, Q1 is a (b + 1)-valent perfluorohydrocarbon group optionally having a hydroxyl group, R1 is a monovalent organic group having at least one hydrolyzable silyl group, b is an integer of 2 or higher, and the b-number of R1 may be the same or different.
(FR) La présente invention concerne un composé éther contenant du fluor, une composition d'éther contenant du fluor, et une solution de revêtement apte à former une couche de surface excellente en termes de propriétés hydrofuges et oléofuges, d'aptitude à l'élimination d'empreintes digitales, de résistance à l'abrasion, de résistance à la lumière et de résistance chimique initiales, ainsi qu'un article comportant ladite couche de surface et un procédé de production associé. Un composé éther contenant du fluor est représenté par A-O-(Rf1O)m-Q1(R1)b. Dans la formule, A est un groupe perfluoroalkyle en C1-20, Rf1 est un groupe perfluoroalkylène, m est un nombre entier compris entre 2 et 500, (Rf1O)m peut comprendre Rf1O ayant deux nombres différents d'atomes de carbone, Q1 est un groupe perfluorohydrocarboné de valence (b + 1) ayant facultativement un groupe hydroxyle, R1 est un groupe organique monovalent ayant au moins un groupe silyle hydrolysable, b est un nombre entier supérieur ou égal à 2, et le nombre b de R1 peut être identique ou différent.
(JA) 初期の撥水撥油性、指紋汚れ除去性、耐摩擦性、耐光性および耐薬品性に優れる表面層を形成できる含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、表面層を有する物品およびその製造方法の提供。 A-O-(Rf1O)-Q(Rで表される含フッ素エーテル化合物。ただし、Aは炭素数1~20のペルフルオロアルキル基であり、Rf1はペルフルオロアルキレン基であり、mは2~500の整数であり、(Rf1O)は炭素数の異なる2種以上のRf1Oからなるものであってもよく、Qは水酸基を有していてもよい(b+1)価のペルフルオロ炭化水素基であり、Rは少なくとも1個の加水分解性シリル基を有する1価の有機基であり、bは、2以上の整数であり、b個のRは、同一であっても異なっていてもよい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)