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1. (WO2019044469) METHOD FOR FORMING PATTERN, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
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Pub. No.: WO/2019/044469 International Application No.: PCT/JP2018/030134
Publication Date: 07.03.2019 International Filing Date: 10.08.2018
IPC:
G03F 7/038 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/20 (2006.01) ,G03F 7/32 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
32
Liquid compositions therefor, e.g. developers
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
高桑 英希 TAKAKUWA Hideki; JP
水谷 一良 MIZUTANI Kazuyoshi; JP
Agent:
中島 順子 NAKASHIMA Junko; JP
米倉 潤造 YONEKURA Junzo; JP
村上 泰規 MURAKAMI Yasunori; JP
Priority Data:
2017-16852101.09.2017JP
Title (EN) METHOD FOR FORMING PATTERN, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
(FR) PROCÉDÉ DE FORMATION DE MOTIF, COMPOSITION DE RÉSERVE, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF ÉLECTRONIQUE
(JA) パターン形成方法、レジスト組成物、電子デバイスの製造方法
Abstract:
(EN) Provided is a method for forming a pattern with which it is possible to obtain a pattern that excels in rectangularity. Also provided are a resist composition used in the method for forming the pattern, and a method for manufacturing an electronic device. The method for forming the pattern includes the steps of: exposing, using an i ray, a resist film that includes a novolac resin and a photo-acid generator that generates acid by exposure to an i ray, the content of the novolac resin being 50 mass% or greater with respect to the total solid content of the resist film; and developing the resist film using a developer that contains an organic solvent and forming a pattern.
(FR) L'invention fournit un procédé de formation de motif qui permet d'obtenir un motif d'une excellente rectangularité. En outre, l'invention fournit une composition de réserve mise en œuvre dans ledit procédé de formation de motif, et un procédé de fabrication de dispositif électronique. Le procédé de formation de motif de l'invention présente : une étape au cours de laquelle un film de réserve qui contient une résine novolaque, et un générateur de photoacide générant un acide par exposition à des rayons i, et dont la teneur en résine novolaque est supérieure ou égale à 50% en masse pour l'ensemble de sa matière solide, est soumis à une exposition à la lumière à l'aide de rayons i ; et une étape au cours de laquelle ledit film de réserve forme un motif par développement au moyen d'un développateur liquide contenant un solvant organique.
(JA) 矩形性に優れるパターンを得られるパターン形成方法を提供する。また、上記パターン形成方法に用いられるレジスト組成物、及び電子デバイスの製造方法を提供する。ノボラック樹脂及びi線露光によって酸を発生する光酸発生剤を含むレジスト膜であって、上記ノボラック樹脂の含有量が、上記レジスト膜の全固形分に対して50質量%以上であるレジスト膜を、i線を用いて露光する工程と、上記レジスト膜を、有機溶剤を含む現像液を用いて現像してパターンを形成する工程と、を有するパターン形成方法。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)