Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2019044432) CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, PRODUCTION METHOD FOR COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/044432 International Application No.: PCT/JP2018/029702
Publication Date: 07.03.2019 International Filing Date: 08.08.2018
IPC:
G02B 5/20 (2006.01) ,C08F 290/12 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/027 (2006.01) ,G03F 7/038 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
290
Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
08
on to polymers modified by introduction of unsaturated side groups
12
Polymers provided for in subclasses C08C or C08F76
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
伊藤 純一 ITO Junichi; JP
金子 祐士 KANEKO Yushi; JP
出井 宏明 IDEI Hiroaki; JP
深見 祐太朗 FUKAMI Yutaro; JP
尾田 和也 OTA Kazuya; JP
Agent:
中島 順子 NAKASHIMA Junko; JP
米倉 潤造 YONEKURA Junzo; JP
村上 泰規 MURAKAMI Yasunori; JP
Priority Data:
2017-16743131.08.2017JP
Title (EN) CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, PRODUCTION METHOD FOR COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
(FR) COMPOSITION DURCISSABLE, PRODUIT DURCI, FILTRE COLORÉ, PROCÉDÉ DE PRODUCTION D'UN FILTRE COLORÉ, ÉLÉMENT D'IMAGERIE À SEMICONDUCTEUR, ET DISPOSITIF D'AFFICHAGE D'IMAGE
(JA) 硬化性組成物、硬化物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置
Abstract:
(EN) Provided is a curable composition that provides, in a cured product thereof, an excellent edge shape within patterns, a cured product having an excellent edge shape, a color filter including the cured product, a production method for the color filter, or a solid-state imaging element or image display device including the color filter. This curable composition contains particles, and at least one polymer compound selected from the group consisting of polymer compounds having a specific structure and a specific absorbance E of less than 5 at a maximum absorption wavelength in the range of 400-800 nm, and polymer compounds having a specific structure and a specific absorbance E of less than 5 at a maximum absorption wavelength in the range of 400-800 nm.
(FR) L'invention concerne une composition durcissable qui fournit, dans un produit durci de celle-ci, une excellente forme de bord à l'intérieur de motifs, un produit durci ayant une excellente forme de bord, un filtre coloré comprenant le produit durci, un procédé de production du filtre coloré, ou un élément d'imagerie à semiconducteur ou un dispositif d'affichage d'image comprenant le filtre coloré. Cette composition durcissable contient des particules, et au moins un composé polymère choisi dans le groupe constitué de composés polymères ayant une structure spécifique et une absorbance spécifique E inférieure à 5 à une longueur d'onde d'absorption maximale dans la plage de 400 à 800 nm, et des composés polymères ayant une structure spécifique et une absorbance spécifique E inférieure à 5 à une longueur d'onde d'absorption maximale dans la plage de 400 à 800 nm.
(JA) 得られる硬化物のパターンにおけるエッジ形状に優れる硬化性組成物、エッジ形状に優れた硬化物、上記硬化物を備えるカラーフィルタ、上記カラーフィルタの製造方法、又は、上記カラーフィルタを備えた固体撮像素子、若しくは画像表示装置を提供する。硬化性組成物は、粒子と、特定の構造を有し、400nm~800nmの範囲内の最大吸収波長における比吸光度Eが5未満である高分子化合物、及び、特定の構造を有し、400nm~800nmの範囲内の最大吸収波長における比吸光度Eが5未満である高分子化合物、よりなる群から選ばれた少なくとも一種の高分子化合物と、を含有する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)