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1. (WO2019044431) METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/044431 International Application No.: PCT/JP2018/029683
Publication Date: 07.03.2019 International Filing Date: 07.08.2018
IPC:
B41N 3/03 (2006.01) ,B41C 1/10 (2006.01) ,B41N 1/08 (2006.01) ,C25D 11/04 (2006.01) ,C25D 11/12 (2006.01) ,C25D 11/16 (2006.01) ,C25D 11/24 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/09 (2006.01) ,G03F 7/30 (2006.01) ,G03F 7/32 (2006.01) ,G03F 7/40 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
3
Preparing for use or conserving printing surfaces
03
Chemical or electrical pretreatment
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
C
PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
1
Forme preparation
10
for lithographic printing; Master sheets for transferring a lithographic image to the forme
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
04
metallic
08
for lithographic printing
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
12
Anodising more than once, e.g. in different baths
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
16
Pretreatment
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
11
Electrolytic coating by surface reaction, i.e. forming conversion layers
02
Anodisation
04
of aluminium or alloys based thereon
18
After-treatment, e.g. pore-sealing
24
Chemical after-treatment
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
32
Liquid compositions therefor, e.g. developers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
40
Treatment after imagewise removal, e.g. baking
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
會津 康平 AIZU, Kohei; JP
宮川 侑也 MIYAKAWA, Yuya; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2017-16743231.08.2017JP
2017-24988126.12.2017JP
Title (EN) METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE
(FR) PROCÉDÉ DE PRODUCTION DE PLAQUE D'IMPRESSION LITHOGRAPHIQUE
(JA) 平版印刷版の作製方法
Abstract:
(EN) Provided is a method for producing a lithographic printing plate, the method including: an exposure step for exposing, in the form of an image, a lithographic-printing-plate original plate that has an image-recording layer on an aluminum support body, and forming an exposed portion and a non-exposed portion; and a developing step for supplying a specific developing fluid and removing the non-exposed portion. The aluminum support body includes an aluminum plate and an aluminum anodized film disposed on the aluminum plate. The anodized film has micropores that extend in a depth direction from the surface on the side opposite from the aluminum plate. The micropores are each configured from a large-diameter hole portion extending from the anodized film surface to a specific position, and a specific small-diameter hole portion that communicates with the bottom part of the large-diameter hole portion. The average diameter of the large-diameter hole portions in the anodized film surface is a specific value, and the average value of the small-diameter hole portions at the communication position is 13 nm or less.
(FR) L'invention concerne un procédé de production d'une plaque d'impression lithographique, le procédé comprenant : une étape d'exposition pour exposer, sous la forme d'une image, une plaque originale de plaque d'impression lithographique qui a une couche d'enregistrement d'image sur un corps de support en aluminium, et former une partie exposée et une partie non exposée ; et une étape de développement consistant à fournir un fluide de développement spécifique et à retirer la partie non exposée. Le corps de support en aluminium comprend une plaque d'aluminium et un film anodisé en aluminium disposé sur la plaque d'aluminium. Le film anodisé a des micropores qui s'étendent dans la direction de la profondeur à partir de la surface sur le côté opposé depuis la plaque d'aluminium. Les micropores sont chacun configurés à partir d'une partie trou de grand diamètre s'étendant de la surface de film anodisé à une position spécifique, et d'une partie trou de petit diamètre spécifique qui communique avec la partie inférieure de la partie trou de grand diamètre. Le diamètre moyen des parties trou de grand diamètre dans la surface de film anodisé est une valeur spécifique, et la valeur moyenne des parties trou de petit diamètre à la position de communication est inférieure ou égale à 13 nm.
(JA) アルミニウム支持体上に画像記録層を有する平版印刷版原版を、画像様に露光し、露光部と未露光部とを形成する露光工程、及び、特定の現像液を供給して上記未露光部を除去する現像工程、を含み、上記アルミニウム支持体が、アルミニウム板と、上記アルミニウム板上に配置されたアルミニウムの陽極酸化皮膜とを含み、上記陽極酸化皮膜は、上記アルミニウム板とは反対側の表面から深さ方向にのびるマイクロポアを有し、上記マイクロポアが、上記陽極酸化被膜表面から特定の位置までのびる大径孔部と、上記大径孔部の底部と連通する特定の小径孔部とから構成され、上記大径孔部の上記陽極酸化被膜表面における平均径が特定の値であり、上記小径孔部の上記連通位置における平均径が13nm以下である、平版印刷版の作製方法。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)