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1. (WO2019044369) BLOCK COPOLYMER FOR PHOTOSENSITIVE PRINTING PLATE MATERIAL HAVING EXCELLENT ABRASION RESISTANCE AND METHOD FOR PRODUCING SAME
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Pub. No.: WO/2019/044369 International Application No.: PCT/JP2018/029078
Publication Date: 07.03.2019 International Filing Date: 02.08.2018
IPC:
C08F 297/04 (2006.01) ,B41N 1/12 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
297
Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
02
using a catalyst of the anionic type
04
polymerising vinyl aromatic monomers and conjugated dienes
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
12
non-metallic other than stone
Applicants:
ジェイエスアール クレイトン エラストマー株式会社 KRATON JSR ELASTOMERS K.K. [JP/JP]; 東京都港区港南2丁目16番2号 太陽生命品川ビル9階 Taiyoseimeishinagawa Bldg. 9F, 2-16-2 Konan, Minato-ku, Tokyo 1080075, JP
Inventors:
鳥居 政俊 TORII Masatoshi; JP
山本 慎吾 YAMAMOTO Shingo; JP
藤▲崎▼ 光 FUJISAKI Hikaru; JP
Agent:
特許業務法人川口國際特許事務所 KAWAGUTI & PARTNERS; 東京都新宿区北新宿二丁目21番1号新宿フロントタワー20階 Shinjuku Front Tower 20F, 2-21-1 Kita-Shinjuku, Shinjuku-ku, Tokyo 1690074, JP
Priority Data:
2017-16399829.08.2017JP
Title (EN) BLOCK COPOLYMER FOR PHOTOSENSITIVE PRINTING PLATE MATERIAL HAVING EXCELLENT ABRASION RESISTANCE AND METHOD FOR PRODUCING SAME
(FR) COPOLYMÈRE SÉQUENCÉ POUR MATÉRIAU DE PLAQUE D'IMPRESSION PHOTOSENSIBLE AYANT UNE EXCELLENTE RÉSISTANCE À L'ABRASION ET SON PROCÉDÉ DE PRODUCTION
(JA) 耐摩耗性に優れた感光性印刷版材用ブロック共重合体及びその製造方法
Abstract:
(EN) Provided is a flexographic printing plate having improved abrasion resistance in addition to the moderate elasticity (softness) required for a flexographic printing plate. The present invention is a block copolymer for a photosensitive printing plate material that is a block copolymer comprising a polymer block composed mainly of at least two aromatic vinyl monomers and a polymer block composed mainly of at least one conjugated diene monomer, wherein the aromatic vinyl monomer introduced into the polymer block composed mainly of a conjugated diene block is 25-50 mass% of the total bonded aromatic vinyl monomer content in the block copolymer.
(FR) L'invention concerne une plaque d'impression flexographique présentant une résistance à l'abrasion améliorée en plus de l'élasticité modérée (souplesse) requise pour une plaque d'impression flexographique. La présente invention concerne un copolymère séquencé pour un matériau de plaque d'impression photosensible qui est un copolymère séquencé comprenant un bloc polymère composé principalement d'au moins deux monomères vinyliques aromatiques et un bloc polymère composé principalement d'au moins un monomère diène conjugué, le monomère vinylique aromatique introduit dans le bloc polymère composé principalement d'un bloc de diène conjugué représentant de 25 à 50 % en masse du contenu total de monomère vinylique aromatique lié dans le copolymère séquencé.
(JA) フレキソ印刷版に要求される適度な弾性(柔らかさ)に加えて、改善された耐摩耗性を備えたフレキソ印刷版を提供する。本発明は、少なくとも2個の芳香族ビニル単量体を主体とする重合体ブロックと、少なくとも1個の共役ジエン単量体を主体とする重合体ブロックからなるブロック共重合体であって、該共役ジエンブロックを主体とする重合体ブロックに導入された芳香族ビニル単量体が該ブロック共重合体中の全結合芳香族ビニル単量体含有量の25~50重量%である感光性印刷版材用ブロック共重合体である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)