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1. (WO2019044339) ELECTRODE FILM AND METHOD FOR MANUFACTURING SAME
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Pub. No.: WO/2019/044339 International Application No.: PCT/JP2018/028740
Publication Date: 07.03.2019 International Filing Date: 31.07.2018
IPC:
H01B 5/14 (2006.01) ,B32B 7/02 (2006.01) ,G06F 3/041 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
B
CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
5
Non-insulated conductors or conductive bodies characterised by their form
14
comprising conductive layers or films on insulating-supports
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
7
Layered products characterised by the relation between layers, i.e. products essentially comprising layers having different physical properties or products characterised by the interconnection of layers
02
in respect of physical properties, e.g. hardness
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
3
Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01
Input arrangements or combined input and output arrangements for interaction between user and computer
03
Arrangements for converting the position or the displacement of a member into a coded form
041
Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Applicants:
NISSHA株式会社 NISSHA CO.,LTD. [JP/JP]; 京都府京都市中京区壬生花井町3番地 3, Mibu Hanai-cho, Nakagyo-ku, Kyoto-shi, Kyoto 6048551, JP
Inventors:
面 了明 Omote, Ryomei; JP
西川 和宏 Nishikawa, Kazuhiro; JP
寺谷 和臣 Teratani, Kazuomi; JP
坂田 喜博 Sakata, Yoshihiro; JP
西村 剛 Nishimura, Takeshi; JP
砂走 孝邦 Sunahase, Takakuni; JP
Priority Data:
2017-16607430.08.2017JP
Title (EN) ELECTRODE FILM AND METHOD FOR MANUFACTURING SAME
(FR) FILM D'ÉLECTRODE ET SON PROCÉDÉ DE FABRICATION
(JA) 電極フィルムおよびその製造方法
Abstract:
(EN) [Problem] To provide an electrode film that is excellent in mesh pattern invisibility and image visibility, and a method for manufacturing the same. [Solution] A method for manufacturing an electrode film comprising: a step for sequentially stacking a metal layer and a black photoresist layer on a first principal surface of a transparent substrate; a step for partially exposing, developing, and patterning in a mesh shape the black photoresist layer; a step for processing the metal layer into a metal mesh electrode by, using the patterned black photoresist layer as an etching mask, etching the metal layer until the width thereof becomes smaller than the width of thin lines constituting a mesh of the black photoresist layer; and a step for softening the black photoresist layer by heating, and thereby covering not only the upper surface but also both side surfaces of each of thin lines constituting a mesh of the metal mesh electrode with a flap of the softened black photoresist layer.
(FR) Le problème décrit par la présente invention est de fournir un film d'électrode qui est excellent en termes d'invisibilité de motif de maillage et de visibilité d'image, et son procédé de fabrication. La solution selon l'invention concerne un procédé de fabrication d'un film d'électrode comprenant : une étape d'empilement séquentiel d'une couche métallique et d'une couche de résine photosensible noire sur une première surface principale d'un substrat transparent; une étape d'exposition partielle, de développement et de formation de motifs dans une forme de maille de la couche de résine photosensible noire; une étape de traitement de la couche métallique en une électrode à mailles métalliques par, à l'aide de la couche de résine photosensible noire à motifs en tant que masque de gravure, graver la couche métallique jusqu'à ce que sa largeur devienne plus petite que la largeur de lignes minces constituant un maillage de la couche de résine photosensible noire; et une étape pour ramollir la couche de résine photosensible noire par chauffage, et recouvrant ainsi non seulement la surface supérieure mais également les deux surfaces latérales de chacune des lignes fines constituant un maillage de l'électrode à mailles métalliques avec un rabat de la couche de résine photosensible noire ramollie.
(JA) 【課題】 メッシュパターンの不可視性および画像の視認性に優れた、電極フィルムおよびその製造方法を提供する。 【解決手段】 電極フィルムの製造方法は、透明基材の第一主面上に金属層、黒色フォトレジスト層を順次積層する工程と、前記黒色フォトレジスト層を部分的に露光し、現像してメッシュ形状にパターニングする工程と、パターニングされた前記黒色フォトレジスト層をエッチングマスクとして、前記黒色フォトレジスト層のメッシュを構成する細線幅より小幅となるまで前記金属層をエッチングして金属メッシュ電極に加工する工程と、前記黒色フォトレジスト層を加熱して軟化させ、軟化した前記黒色フォトレジスト層の垂れにより前記金属メッシュ電極のメッシュを構成する細線の上面のみならず両側面まで被覆させる工程と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)