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1. (WO2019044319) CONVEYANCE-BASED WASHING DEVICE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2019/044319 International Application No.: PCT/JP2018/028420
Publication Date: 07.03.2019 International Filing Date: 30.07.2018
IPC:
H01L 21/027 (2006.01) ,G03F 7/20 (2006.01) ,G03F 7/30 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
30
Imagewise removal using liquid means
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
白川 征人 SHIRAKAWA Masato; JP
渡辺 年宏 WATANABE Toshihiro; JP
Agent:
渡辺 望稔 WATANABE Mochitoshi; JP
伊東 秀明 ITOH Hideaki; JP
三橋 史生 MITSUHASHI Fumio; JP
Priority Data:
2017-16577130.08.2017JP
Title (EN) CONVEYANCE-BASED WASHING DEVICE
(FR) DISPOSITIF DE LAVAGE REPOSANT SUR LE TRANSPORT
(JA) 搬送型洗出し装置
Abstract:
(EN) Provided is a conveyance-based washing device allowing maintainability and productivity to be achieved simultaneously. This conveyance-based washing device uses a washing solution to develop a flexographic printing plate precursor after imagewise exposure. This conveyance-based washing device comprises: a conveyor section for conveying the flexographic printing plate precursor via a conveyance path containing a curved conveyance path; and a development unit for developing the flexographic printing plate precursor, which is in a state of having been immersed in the washing solution and conveyed by the conveyor section.
(FR) L'invention concerne un dispositif de lavage reposant sur le transport permettant d'obtenir simultanément maintenabilité et productivité. Ce dispositif de lavage reposant sur le transport utilise une solution de lavage permettant de développer un précurseur de plaque d'impression flexographique après exposition à une image. Ce dispositif de lavage reposant sur le transport comprend : une section de convoyeur permettant de transporter le précurseur de plaque d'impression flexographique via un trajet de transport contenant un trajet de transport incurvé ; et une unité de développement permettant de développer le précurseur de plaque d'impression flexographique, qui est dans un état ayant été immergé dans la solution de lavage et transporté par la section de convoyeur.
(JA) メンテナンス性と生産性との両立を図ることができる搬送型洗出し装置を提供する。搬送型洗出し装置は、画像様露光後のフレキソ印刷版原版を洗い出し液を用いて現像するものである。搬送型洗出し装置は、フレキソ印刷版原版を、湾曲した搬送路を含む搬送経路で搬送する搬送部と、搬送部により洗い出し液に浸漬され、かつ搬送された状態とされたフレキソ印刷版原版に対して、現像を行う現像ユニットとを有する。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)