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1. (WO2019044277) METHOD FOR MANUFACTURING COLOR FILTER, METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT, METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE, AND COLOR FILTER
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Pub. No.: WO/2019/044277 International Application No.: PCT/JP2018/027631
Publication Date: 07.03.2019 International Filing Date: 24.07.2018
IPC:
G02B 5/20 (2006.01) ,G02F 1/1335 (2006.01) ,G03F 7/004 (2006.01) ,H01L 27/146 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1335
Structural association of optical devices, e.g. polarisers, reflectors, with the cell
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
14
including semiconductor components sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
144
Devices controlled by radiation
146
Imager structures
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
小泉 宙夢 KOIZUMI Hiromu; JP
尾田 和也 OTA Kazuya; JP
Agent:
中島 順子 NAKASHIMA Junko; JP
米倉 潤造 YONEKURA Junzo; JP
村上 泰規 MURAKAMI Yasunori; JP
Priority Data:
2017-16550430.08.2017JP
Title (EN) METHOD FOR MANUFACTURING COLOR FILTER, METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT, METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE, AND COLOR FILTER
(FR) PROCÉDÉ DE FABRICATION D'UN FILTRE COLORÉ, PROCÉDÉ DE FABRICATION D'UN ÉLÉMENT D'IMAGERIE À SEMI-CONDUCTEURS, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF D'AFFICHAGE D'IMAGE ET FILTRE COLORÉ
(JA) カラーフィルタの製造方法、固体撮像素子の製造方法、画像表示装置の製造方法およびカラーフィルタ
Abstract:
(EN) The present invention provides a method which is for manufacturing a color filter and with which pattern formability of pixels is good and the generation of residue on another pixel after pixel formation and the generation of color migration between adjacent pixels can be inhibited. The present invention further provides a method for manufacturing a solid-state imaging element, a method for manufacturing an image display device, and a color filter. This method for manufacturing a color filter includes: a step for applying a transparent layer forming composition on the surface of a first pixel 2 formed on a support body 1, and forming a transparent layer 3 having an average thickness of no more than 300 nm; a step for applying a pixel forming composition on the first pixel 2 having the transparent layer 3 formed thereon, and forming a composition layer 4a for pixel formation; and a step for forming a pattern on the composition layer 4a for pixel formation and forming a second pixel 4 having a different color than the first pixel 2.
(FR) La présente invention concerne un procédé qui permet de fabriquer un filtre coloré et au moyen duquel l'aptitude à la formation de motifs de pixels est bonne, la génération de résidus sur un autre pixel après la formation de pixels et la génération de migration de couleur entre des pixels adjacents pouvant être inhibées. La présente invention concerne en outre un procédé de fabrication d'un élément d'imagerie à semi-conducteurs, un procédé de fabrication d'un dispositif d'affichage d'image et un filtre coloré. Ce procédé de fabrication d'un filtre coloré comprend les étapes suivantes : l'application d'une composition de formation de couche transparente sur la surface d'un premier pixel (2) formé sur un corps de support (1), et la formation d'une couche transparente (3) ayant une épaisseur moyenne inférieure ou égale à 300 nm ; l'application d'une composition de formation de pixels sur le premier pixel (2) ayant la couche transparente (3) formée dessus, et la formation d'une couche de composition (4a) destinée à la formation de pixels ; la formation d'un motif sur la couche de composition (4a) destinée à la formation de pixels et la formation d'un second pixel (4) ayant une couleur différente de celle du premier pixel (2).
(JA) 画素のパターン形成性が良好であり、かつ、画素形成後の他の画素上の残渣の発生や、隣接する画素間における色移りの発生を抑制できるカラーフィルタの製造方法を提供する。また、固体撮像素子の製造方法、画像表示装置の製造方法およびカラーフィルタを提供する。このカラーフィルタの製造方法は、支持体1上に形成された第1の画素2の表面に透明層形成用組成物を適用して平均厚さ300nm以下の透明層3を形成する工程と、透明層3が形成された第1の画素2上に画素形成用組成物を適用して画素形成用組成物層4aを形成する工程と、画素形成用組成物層4aに対してパターン形成を行い、第1の画素2とは異なる色の第2の画素4を形成する工程とを含む。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)