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1. (WO2019044138) PHOTOSENSITIVE TRANSFER MATERIAL, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING CIRCUIT WIRING
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Pub. No.: WO/2019/044138 International Application No.: PCT/JP2018/024071
Publication Date: 07.03.2019 International Filing Date: 25.06.2018
IPC:
G03F 7/11 (2006.01) ,B32B 7/02 (2006.01) ,B32B 7/06 (2006.01) ,B32B 27/18 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/039 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
7
Layered products characterised by the relation between layers, i.e. products essentially comprising layers having different physical properties or products characterised by the interconnection of layers
02
in respect of physical properties, e.g. hardness
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
7
Layered products characterised by the relation between layers, i.e. products essentially comprising layers having different physical properties or products characterised by the interconnection of layers
04
characterised by the connection of layers
06
permitting easy separation
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27
Layered products essentially comprising synthetic resin
18
characterised by the use of special additives
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
藤本 進二 FUJIMOTO, Shinji; JP
松田 知樹 MATSUDA, Tomoki; JP
石坂 壮二 ISHIZAKA, Soji; JP
篠田 克己 SASATA, Katsumi; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2017-16335528.08.2017JP
Title (EN) PHOTOSENSITIVE TRANSFER MATERIAL, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING CIRCUIT WIRING
(FR) MATÉRIAU DE TRANSFERT PHOTOSENSIBLE, PROCÉDÉ POUR LE FABRIQUER ET PROCÉDER DE FABRICATION DE CÂBLAGE DE CIRCUIT
(JA) 感光性転写材料及びその製造方法、並びに、回路配線の製造方法
Abstract:
(EN) A positive photosensitive transfer material, a method for manufacturing same, and a method for manufacturing circuit wiring in which the photosensitive transfer material is used. In the positive photosensitive transfer material, a photosensitive resin composition layer and a UV-ray-absorbing layer are present on a temporary support body. The photosensitive resin composition layer includes a photoacid generator and a polymer A1 that has structural units having an acid group that is protected by an acid-decomposable group. The UV-ray-absorbing layer includes a polymer A2 and an organic UV-ray-absorbing agent, or includes a polymer A3 having a UV-ray-absorbing function. The glass transition temperature of the polymer A2 or the glass transition temperature of the polymer A3 included in the UV-ray-absorbing layer does not exceed 90°C.
(FR) L'invention concerne un matériau de transfert photosensible et positif, un procédé pour le fabriquer et un procédé de fabrication de câblage de circuit dans lequel le matériau de transfert photosensible est utilisé. Dans le matériau de transfert photosensible et positif, une couche de composition de résine photosensible et une couche absorbant les rayons UV sont présentes sur un support temporaire. La couche de composition de résine photosensible comprend un générateur photoacide et un polymère A1 qui a des motifs structuraux ayant un groupe acide qui est protégé par un groupe décomposable par un acide. La couche absorbant les rayons UV comprend soit un polymère A2 et un agent organique qui absorbe les rayons UV, soit un polymère A3 ayant une fonction d'absorption des rayons UV. La température de transition vitreuse du polymère A2 ou la température de transition vitreuse du polymère A3 inclus dans la couche absorbant les rayons UV ne dépasse pas 90°C
(JA) 仮支持体上に、感光性樹脂組成物層、及び、紫外線吸収層を有し、上記感光性樹脂組成物層が、酸分解性基で保護された酸基を有する構成単位を有する重合体A1と、光酸発生剤とを含み、上記紫外線吸収層が、有機紫外線吸収剤と重合体A2とを含むか、又は、紫外線吸収能を有する重合体A3を含み、上記紫外線吸収層に含まれる、上記重合体A2のガラス転移温度又は上記重合体A3のガラス転移温度が、90℃以下であるポジ型感光性転写材料及びその製造方法、並びに、上記感光性転写材料を用いた回路配線の製造方法。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)