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1. (WO2019044033) CHEMICAL SUPPLY DEVICE AND WATER PURIFICATION SYSTEM USING SAME
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Pub. No.: WO/2019/044033 International Application No.: PCT/JP2018/016708
Publication Date: 07.03.2019 International Filing Date: 25.04.2018
IPC:
C02F 1/00 (2006.01) ,B01D 21/00 (2006.01) ,B01D 21/01 (2006.01) ,B01J 4/00 (2006.01) ,C02F 1/52 (2006.01) ,C02F 1/76 (2006.01) ,C02F 1/78 (2006.01)
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
21
Separation of suspended solid particles from liquids by sedimentation
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
21
Separation of suspended solid particles from liquids by sedimentation
01
using flocculating agents
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
J
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
4
Feed devices; Feed or outlet regulating devices
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
52
by flocculation or precipitation of suspended impurities
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
72
by oxidation
76
with halogens or compounds of halogens
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
72
by oxidation
78
with ozone
Applicants:
パナソニックIPマネジメント株式会社 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. [JP/JP]; 大阪府大阪市中央区城見2丁目1番61号 1-61, Shiromi 2-chome, Chuo-ku, Osaka-shi, Osaka 5406207, JP
Inventors:
野間 真二郎 NOMA Shinjiro; --
廣田 達哉 HIROTA Tatsuya; --
平山 哲章 HIRAYAMA Tetsuaki; --
五百崎 太輔 IHOZAKI Taisuke; --
藤田 浩史 FUJITA Hirofumi; --
丸尾 ゆうこ MARUO Yuko; --
Agent:
伊藤 正和 ITO Masakazu; JP
松本 隆芳 MATSUMOTO Takayoshi; JP
細川 覚 HOSOKAWA Satoru; JP
森 太士 MORI Futoshi; JP
Priority Data:
2017-16341928.08.2017JP
Title (EN) CHEMICAL SUPPLY DEVICE AND WATER PURIFICATION SYSTEM USING SAME
(FR) DISPOSITIF D'ALIMENTATION EN PRODUITS CHIMIQUES ET SYSTÈME DE PURIFICATION D'EAU ASSOCIÉ À CE DISPOSITIF
(JA) 薬剤供給装置及びそれを用いた水浄化システム
Abstract:
(EN) A chemical supply device (1) is provided with: a chemical holding part (2) which comprises a membrane (6) which a chemical (8) can permeate and a membrane support (7) for supporting the membrane (6), and which is for holding the chemical (8); a water supply part (3) for supplying water that is to be treated to the membrane (6); a mixing part (4) for mixing the water being treated that has been supplied from the water supply part (3) and the chemical (8) that has permeated the membrane (6); and a discharging part (5) for discharging the water being treated into which the chemical (8) has been mixed.
(FR) Un dispositif d'alimentation en produit chimique (1) est pourvu : d'un élément contenant une substance chimique (2) qui comprend une membrane (6) qu'un produit chimique (8) peut imprégner, et un support de membrane (7) pour soutenir la membrane (6), et qui est destinée à contenir le produit chimique (8); d'un élément d'alimentation en eau (3) pour acheminer l'eau à traiter vers la membrane (6); d'un élément de mélange (4) pour mélanger l'eau à traiter qui provient de l'élément d'alimentation en eau (3) et le produit chimique (8) qui a traversé la membrane (6); et d'un élément d'évacuation (5) pour évacuer l'eau traitée dans laquelle le produit chimique (8) a été mélangé.
(JA) 薬剤供給装置(1)は、薬剤(8)が浸透可能な膜(6)と、膜(6)を支持する膜支持部(7)と、を含み、薬剤(8)を収容する薬剤収容部(2)と、膜(6)に被処理水を供給する水供給部(3)と、水供給部(3)から供給された被処理水と、膜(6)を浸透した薬剤(8)とを混合する混合部(4)と、薬剤(8)が混合された被処理水を排出する排出部(5)と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)