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1. (WO2019043947) ETCHING DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
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Pub. No.: WO/2019/043947 International Application No.: PCT/JP2017/031799
Publication Date: 07.03.2019 International Filing Date: 04.09.2017
IPC:
H05B 33/10 (2006.01) ,H01L 27/32 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/02 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
10
Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28
including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32
with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
Applicants:
シャープ株式会社 SHARP KABUSHIKI KAISHA [JP/JP]; 大阪府堺市堺区匠町1番地 1, Takumi-cho, Sakai-ku, Sakai City, Osaka 5908522, JP
Inventors:
谷山 博己 TANIYAMA, Hiroki; --
岡部 達 OKABE, Tohru; --
齋田 信介 SAIDA, Shinsuke; --
市川 伸治 ICHIKAWA, Shinji; --
郡司 遼佑 GUNJI, Ryosuke; --
仲田 芳浩 NAKADA, Yoshihiro; --
井上 彬 INOUE, Akira; --
神村 浩治 JINMURA, Hiroharu; --
Agent:
特許業務法人HARAKENZO WORLD PATENT & TRADEMARK HARAKENZO WORLD PATENT & TRADEMARK; 大阪府大阪市北区天神橋2丁目北2番6号 大和南森町ビル Daiwa Minamimorimachi Building, 2-6, Tenjinbashi 2-chome Kita, Kita-ku, Osaka-shi, Osaka 5300041, JP
Priority Data:
Title (EN) ETCHING DEVICE, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
(FR) DISPOSITIF DE GRAVURE, ET PROCÉDÉ DE FABRICATION DE DISPOSITIF D'AFFICHAGE
(JA) エッチング装置、および表示装置の製造方法
Abstract:
(EN) An etching device (1) is provided with: a chemical treatment tank (20), in which a substrate (2) is transferred; and a jetting section (21), which is disposed in the chemical treatment tank (20), and which has a blowout port (22) facing the direction not intersecting the surface of the substrate (2), said jetting section jetting a mist-like etchant chemical (22) through the blowout port (22).
(FR) La présente invention concerne un dispositif de gravure qui est pourvu : d'un réservoir de traitement chimique (20), dans lequel un substrat (2) est transféré ; et d'une section de projection (21), qui est disposée dans le réservoir de traitement chimique (20), et qui a un orifice de soufflage (22) faisant face à la direction ne croisant pas la surface du substrat (2), ladite section de projection projetant un produit chimique d'agent de gravure de type brume (22) à travers l'orifice de soufflage (22).
(JA) エッチング装置(1)は、内部で基板(2)が搬送される薬液処理槽(20)と、薬液処理槽(20)の内部に配置され、基板(2)の表面と交わらない方向に向く吹き出し口(22)を有し、かつ吹き出し口(22)を通じて霧状のエッチャント薬液(22)を噴射する噴射部(21)とを備えている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)